SCHEMBL3337875

SCHEMBL3337875

COc1ccccc1C[SiH](OC)OC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.52
TAAR1 Q96RJ0 1/20 0.52
CHRM2 P08172 4/20 0.50
CHRM1 P11229 1/20 0.50
ALDH1A1 P00352 2/20 0.48
GAA P10253 1/20 0.48
MAPT P10636 1/20 0.48
CA1 P00915 2/20 0.48
CA2 P00918 2/20 0.48
CA7 P43166 2/20 0.48
CA9 Q16790 2/20 0.48
CA12 O43570 1/20 0.48
CA4 P22748 1/20 0.48
CA14 Q9ULX7 1/20 0.48
SIGMAR1 Q99720 1/20 0.46
AOC3 Q16853 1/20 0.46
GRIN1 Q05586 3/20 0.44
GRIN2A Q12879 3/20 0.44
BCHE P06276 2/20 0.44
ACHE P22303 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3340102 0.82 IDO1 (0.47) IDO1TAAR1CHRM2CHRM1ALDH1A1
SCHEMBL20658038 0.82 SMN1; SMN2 (0.46) ALDH1A1GAACA1CA2CA12
SCHEMBL2819128 0.77 TAAR1 (0.43) TAAR1CHRM2ALDH1A1GAAACHE
SCHEMBL63870 0.77 ALDH1A1 (0.41) IDO1TAAR1ALDH1A1GAAMAPT
SCHEMBL9412741 0.77 GABRA1 (0.38) IDO1TAAR1ALDH1A1MAPTLMNA
SCHEMBL2202416 0.75 IDO1 (0.45) IDO1TAAR1CHRM2AOC3LMNA
SCHEMBL963477 0.75 ALDH1A1 (0.34) IDO1TAAR1ALDH1A1
SCHEMBL3296809 0.75 IDO1 (0.61) IDO1TAAR1CHRM2CHRM1ALDH1A1
SCHEMBL28858018 0.75 TAAR1 (0.75) IDO1TAAR1CHRM2CHRM1ALDH1A1
SCHEMBL27583392 0.73 IDO1 (0.59) IDO1TAAR1CHRM2CHRM1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107076894-B Infrared shielding composition, cured film, and solid-state imaging device JSR株式会社 2020-01-31 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed