SCHEMBL963477

SCHEMBL963477

CO[SiH](Cc1ccccc1CCl)OC

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
TSHR P16473 1/20 0.34
IDO1 P14902 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9412741 0.81 GABRA1 (0.38) ALDH1A1TSHRIDO1TAAR1
SCHEMBL3341517 0.80 ALDH1A1 (0.32) ALDH1A1TSHR
SCHEMBL2202416 0.79 IDO1 (0.45) IDO1TAAR1
SCHEMBL63870 0.77 ALDH1A1 (0.41) ALDH1A1IDO1TAAR1
SCHEMBL2819128 0.77 TAAR1 (0.43) ALDH1A1TSHRTAAR1
SCHEMBL3337875 0.75 IDO1 (0.52) ALDH1A1IDO1TAAR1
SCHEMBL5152254 0.75 PNMT (0.35) ALDH1A1IDO1TAAR1
SCHEMBL150237 0.74 TSHR (0.50) ALDH1A1TSHRIDO1TAAR1
SCHEMBL29350459 0.74 TSHR (0.50) ALDH1A1TSHRIDO1TAAR1
SCHEMBL3109795 0.73 GABRA1 (0.39) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed