SCHEMBL3338048

SCHEMBL3338048

CC(C)(C)O[SiH2]CCCc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.40
POLB P06746 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
SIGMAR1 Q99720 4/20 0.40
MAOA P21397 1/20 0.39
CHRM2 P08172 1/20 0.39
HTR1A P08908 1/20 0.39
ADRA2A P08913 1/20 0.39
CHRM1 P11229 1/20 0.39
DRD1 P21728 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
ADRA1A P35348 1/20 0.39
OPRM1 P35372 1/20 0.39
DRD3 P35462 1/20 0.39
SLC6A3 Q01959 1/20 0.39
KCNH2 Q12809 1/20 0.39
AOC3 Q16853 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15135577 0.89 ALDH1A1 (0.38) IDO1L3MBTL1MEN1KMT2ASLC6A2
SCHEMBL8136862 0.80 IDO1 (0.47) IDO1L3MBTL1MEN1KMT2ASIGMAR1
SCHEMBL3908823 0.78 MAOA (0.53) MEN1KMT2ASIGMAR1MAOACHRM2
SCHEMBL28444045 0.78 IDO1 (0.48) IDO1L3MBTL1SIGMAR1MAOAADRA1A
SCHEMBL29235981 0.76 AOC3 (0.40) IDO1SLC6A2AOC3
SCHEMBL3342122 0.76 CHRM2 (0.44) IDO1L3MBTL1MEN1KMT2ASIGMAR1
SCHEMBL3682331 0.75 IDO1 (0.45) IDO1L3MBTL1MEN1KMT2ASIGMAR1
SCHEMBL3342172 0.74 SIGMAR1 (0.42) IDO1L3MBTL1MEN1KMT2ASIGMAR1
SCHEMBL6765070 0.74 IDO1 (0.41) IDO1L3MBTL1MEN1KMT2ASIGMAR1
SCHEMBL3917120 0.74 MAPT (0.52) L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101133364-B Composition for resist underlayer film and method for producing same JSR CORP 2013-03-20 CN disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed