Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3378474 | 0.81 | MEN1 (0.38) | MEN1POLBKMT2A | |
| SCHEMBL435646 | 0.74 | MEN1 (0.42) | MEN1POLBKMT2A | |
| SCHEMBL961357 | 0.71 | MEN1 (0.39) | MEN1POLBKMT2A | |
| SCHEMBL14914664 | 0.70 | MEN1 (0.36) | MEN1POLBKMT2A | |
| SCHEMBL28142563 | 0.68 | TDP1 (0.43) | MEN1POLBKMT2A | |
| SCHEMBL985365 | 0.68 | MEN1 (0.37) | MEN1POLBKMT2A | |
| SCHEMBL15065262 | 0.67 | — | — | |
| SCHEMBL11729970 | 0.66 | — | — | |
| SCHEMBL433193 | 0.66 | MEN1 (0.42) | MEN1POLBKMT2A | |
| SCHEMBL436622 | 0.66 | MEN1 (0.42) | MEN1POLBKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |