SCHEMBL3340544

SCHEMBL3340544

CCO[Si](C)(OCC)C(C)Cc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.46
CYP2D6 P10635 1/20 0.46
SIGMAR1 Q99720 5/20 0.44
TAAR1 Q96RJ0 4/20 0.44
SLC6A2 P23975 4/20 0.44
SLC6A4 P31645 3/20 0.44
SLC6A3 Q01959 3/20 0.44
MAOA P21397 2/20 0.44
CYP2A6 P11509 1/20 0.44
ADORA2A P29274 1/20 0.44
ADORA1 P30542 1/20 0.44
SLC18A2 Q05940 1/20 0.41
ADRA2B P18089 2/20 0.38
ADRA2C P18825 2/20 0.38
ADRA1A P35348 2/20 0.38
OPRK1 P41145 2/20 0.38
HTR2A P28223 1/20 0.38
KCNH2 Q12809 1/20 0.38
ADRA2A P08913 1/20 0.38
MAOB P27338 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28065353 0.83 SIGMAR1 (0.45) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL3339003 0.81 CYP2D6 (0.48) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL27769944 0.77 TAAR1 (0.36) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL2772048 0.76 SIGMAR1 (0.54) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL8759229 0.75 SIGMAR1 (0.48) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL7938711 0.73 TAAR1 (0.38) TRPA1TAAR1
SCHEMBL2181964 0.73 TAAR1 (0.47) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL8714924 0.72 SIGMAR1 (0.50) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL28677694 0.72 SIGMAR1 (0.50) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2
SCHEMBL8759204 0.72 SIGMAR1 (0.50) TRPA1CYP2D6SIGMAR1TAAR1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed