SCHEMBL3339003

SCHEMBL3339003

CO[Si](C)(OC)C(C)Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.48
TRPA1 O75762 2/20 0.47
SIGMAR1 Q99720 6/20 0.47
TAAR1 Q96RJ0 5/20 0.47
SLC6A2 P23975 4/20 0.47
SLC6A4 P31645 3/20 0.47
SLC6A3 Q01959 3/20 0.47
MAOA P21397 1/20 0.47
CYP2A6 P11509 1/20 0.47
ADORA2A P29274 1/20 0.47
ADORA1 P30542 1/20 0.47
SLC18A2 Q05940 1/20 0.44
ADRA2B P18089 1/20 0.40
ADRA2C P18825 1/20 0.40
HTR2A P28223 1/20 0.40
ADRA1A P35348 1/20 0.40
OPRK1 P41145 1/20 0.40
KCNH2 Q12809 1/20 0.40
EPHX1 P07099 1/20 0.40
MEN1 O00255 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10696904 0.82 SIGMAR1 (0.48) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL3340544 0.81 TRPA1 (0.46) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
Ammonia Solution, Strong SCHEMBL28922168 0.80 SIGMAR1 (0.47) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL2772048 0.79 SIGMAR1 (0.54) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL8759229 0.78 SIGMAR1 (0.48) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL2543703 0.76 TAAR1 (0.38) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL15453595 0.75 CYP2D6 (0.49) CYP2D6SIGMAR1TAAR1SLC6A2SLC6A4
SCHEMBL8759204 0.75 SIGMAR1 (0.50) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL8714924 0.75 SIGMAR1 (0.50) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2
SCHEMBL15135678 0.74 SIGMAR1 (0.45) CYP2D6TRPA1SIGMAR1TAAR1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed