Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 2/20 | 0.38 |
| ▸ | ADRA2B | P18089 | 2/20 | 0.38 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21351773 | 0.93 | ADRA2A (0.41) | ADRA2AADRA2BADRA2CGMNNCYP1A2 | |
| SCHEMBL152241 | 0.93 | — | — | |
| SCHEMBL4458237 | 0.84 | — | — | |
| Methacrylic Acid SCHEMBL6553304 | 0.79 | ADRA2A (0.35) | ADRA2AADRA2BADRA2CCYP3A4 | |
| SCHEMBL9847231 | 0.79 | — | — | |
| SCHEMBL466674 | 0.78 | ADRA2A (0.41) | ADRA2AADRA2BADRA2CGMNNCYP1A2 | |
| SCHEMBL29117852 | 0.78 | KCNN4 (0.37) | ADRA2AADRA2BADRA2CGMNNCYP1A2 | |
| SCHEMBL18069695 | 0.77 | NOS3 (0.38) | ADRA2AADRA2BADRA2C | |
| SCHEMBL23070521 | 0.77 | ADRA2A (0.36) | ADRA2AADRA2BADRA2C | |
| SCHEMBL14738172 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |