SCHEMBL3341050

SCHEMBL3341050

CCCC(OC(C)=O)[SiH](OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CHRM1 P11229 2/20 0.31
AKR1A1 P14550 1/20 0.31
CHRM3 P20309 1/20 0.31
HTR2A P28223 1/20 0.31
HTR2C P28335 1/20 0.31
ADRA1A P35348 1/20 0.31
HRH1 P35367 1/20 0.31
DRD3 P35462 1/20 0.31
SLC6A3 Q01959 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
TBXA2R P21731 1/20 0.31
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3341327 0.84 TSHR (0.36) TSHRALDH1A1LMNAHSD17B10CHRM1
SCHEMBL963718 0.82 TSHR (0.34) TSHRALDH1A1LMNAHSD17B10CHRM1
SCHEMBL555328 0.82 ALDH1A1 (0.36) TSHRALDH1A1
SCHEMBL17138324 0.76 TSHR (0.36) TSHRALDH1A1LMNAHSD17B10CHRM1
SCHEMBL524941 0.76 TSHR (0.36) TSHRALDH1A1LMNAHSD17B10CHRM1
SCHEMBL81709 0.70
SCHEMBL5694155 0.69
SCHEMBL8668722 0.68 TSHR (0.42) TSHRALDH1A1TDP1
SCHEMBL19409885 0.68 ALDH1A1 (0.36) TSHRALDH1A1
SCHEMBL4612809 0.68 CHRM1 (0.30) CHRM1AKR1A1CHRM3HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
EP-0991698-B1 SILICONE OLIGOMERS AND CURABLE COMPOSITIONS CONTAINING SAME MOMENTIVE PERFORMANCE MAT INC (US) 2012-10-24 EP disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed
US-6515043-B2 Surface treatment of filler CROMPTON CORPORATION 2003-02-04 US disclosed
US-6395856-B1 CURABLE POLYSILOXANES FOR PROTECTIVE COATINGS FOR WIRES CROMPTON CORPORATION 2002-05-28 US disclosed
US-20010021761-A1 Silicone oligomers with heigher alkoxy groups MOMENTIVE PERFORMANCE MATERIALS INC. 2001-09-13 US disclosed
US-6207783-B1 UNDERGROUND INSULATION CROMPTON CORPORATION 2001-03-27 US disclosed