SCHEMBL3342836

SCHEMBL3342836

CCCCN(c1ccccc1)[C@@H](C)C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.45
ADRB2 P07550 1/20 0.45
NPC1 O15118 1/20 0.44
JAK2 O60674 1/20 0.44
RAB9A P51151 1/20 0.44
PAX8 Q06710 1/20 0.44
TP53 P04637 2/20 0.44
TACR1 P25103 1/20 0.43
ESR1 P03372 1/20 0.42
GAA P10253 1/20 0.41
HPGD P15428 1/20 0.41
GLA P06280 1/20 0.41
TSHR P16473 1/20 0.41
CNR2 P34972 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
PGR P06401 1/20 0.40
ADRA2A P08913 1/20 0.40
ADRA2B P18089 1/20 0.40
HTR2A P28223 1/20 0.40
HRH1 P35367 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3342832 1.00 ALDH1A1 (0.45) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL10782208 0.95 NPC1 (0.50) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL11031009 0.95 NPC1 (0.50) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL9632865 0.90 TP53 (0.46) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL9632869 0.90 TP53 (0.46) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL15957137 0.87 ALDH1A1 (0.43) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL6555727 0.86 CNR2 (0.40) ALDH1A1RAB9AHPGDCNR2KCNH2
SCHEMBL6555724 0.86 CNR2 (0.40) ALDH1A1RAB9AHPGDCNR2KCNH2
SCHEMBL7766902 0.86 ALDH1A1 (0.42) ALDH1A1ADRB2NPC1JAK2RAB9A
SCHEMBL6555754 0.86 ALOX5 (0.46) ALDH1A1RAB9ATP53TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
WO-2023074325-A1 PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2023-05-04 WO disclosed
US-20100159691-A1 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE ASAHI KASEI EMD CORPORATION (JP) 2010-06-24 US disclosed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed