Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.39 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11670227 | 0.85 | POLB (0.45) | MAPK1TDP1MEN1KMT2ATP53 | |
| SCHEMBL3954915 | 0.83 | MEN1 (0.46) | MEN1KMT2ATP53SMN1; SMN2CYP3A4 | |
| SCHEMBL13603874 | 0.81 | TSHR (0.46) | MAPK1TDP1TP53SMN1; SMN2TSHR | |
| SCHEMBL7056650 | 0.80 | KCNN4 (0.45) | MAPK1MEN1KMT2AKCNA5 | |
| SCHEMBL430658 | 0.80 | TP53 (0.49) | TDP1MEN1KMT2ATP53SMN1; SMN2 | |
| SCHEMBL14355457 | 0.80 | SMN1; SMN2 (0.44) | TDP1MEN1KMT2ATP53SMN1; SMN2 | |
| SCHEMBL202173 | 0.79 | TDP1 (0.50) | TDP1MEN1KMT2ASMN1; SMN2CYP3A4 | |
| SCHEMBL11694085 | 0.79 | ALDH1A1 (0.41) | MEN1KMT2ATP53SMN1; SMN2CYP3A4 | |
| SCHEMBL2947005 | 0.79 | CYP3A4 (0.50) | MAPK1SMN1; SMN2CYP3A4TSHRHDAC1 | |
| SCHEMBL547493 | 0.78 | ALDH1A1 (0.51) | TDP1MEN1KMT2ATP53SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | claimed |
| CN-120077329-A | Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern | 旭化成株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-118159908-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2024-06-07 | — | — | CN | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| WO-2023074325-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2023-05-04 | — | — | WO | disclosed |
| CN-101779165-B | Photosensitive resin composition and laminate thereof | ASAHI KASEI E MATERIALS CORP | 2014-09-24 | — | — | CN | disclosed |
| CN-101449208-B | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORP. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101075090-A | Dry film corrosion resisting agent | ASAHI CHEMICAL ELECTRONIC MATE (JP) | 2007-11-21 | — | — | CN | disclosed |
| US-5153236-A | Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images | HITACHI CHEMICAL CO., LTD. (JP) | 1992-10-06 | — | — | US | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |