Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 2/20 | 0.52 |
| ▸ | MAOB | P27338 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | HPGD | P15428 | 4/20 | 0.46 |
| ▸ | GLA | P06280 | 4/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | CASP1 | P29466 | 2/20 | 0.46 |
| ▸ | CASP7 | P55210 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.46 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.46 |
| ▸ | NQO2 | P16083 | 1/20 | 0.46 |
| ▸ | DRD1 | P21728 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1102408 | 0.82 | KDM4E (0.50) | MAOAMAOBPOLBKDM4EALDH1A1 | |
| SCHEMBL17423904 | 0.82 | KDM4E (0.50) | MAOAMAOBPOLBKDM4EALDH1A1 | |
| SCHEMBL6749119 | 0.81 | CYP1A2 (0.36) | KDM4EALDH1A1SMN1; SMN2HSD17B10TDP1 | |
| SCHEMBL3347479 | 0.78 | POLB (0.47) | MAOAMAOBPOLBKDM4EALDH1A1 | |
| Hydrochloric Acid SCHEMBL9687047 | 0.76 | MAOA (0.50) | MAOAMAOBKDM4EALDH1A1HPGD | |
| SCHEMBL29853736 | 0.76 | L3MBTL1 (0.45) | MAOAPOLBKDM4EALDH1A1HPGD | |
| SCHEMBL4645643 | 0.76 | L3MBTL1 (0.45) | MAOAPOLBKDM4EALDH1A1HPGD | |
| SCHEMBL3343034 | 0.75 | POLB (0.59) | MAOAMAOBPOLBKDM4EALDH1A1 | |
| SCHEMBL13941688 | 0.75 | POLB (0.53) | MAOAMAOBPOLBKDM4EALDH1A1 | |
| SCHEMBL12386870 | 0.75 | KDM4E (0.50) | MAOAMAOBPOLBKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| CN-119024642-A | Photocurable resin composition, application thereof and photosensitive dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-11-26 | — | — | CN | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| CN-111596526-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2020-08-28 | — | — | CN | disclosed |
| CN-111566173-A | Coating composition, method for curing the composition, barrier film, and method for producing cured product | 株式会社艾迪科 | 2020-08-21 | — | — | CN | disclosed |
| CN-111527450-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2020-08-11 | — | — | CN | disclosed |
| CN-106462068-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-111316164-A | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2020-06-19 | — | — | CN | disclosed |
| CN-106966074-B | Photosensitive resin laminate roll | 旭化成株式会社 | 2020-05-05 | — | — | CN | disclosed |
| CN-106918993-B | Photosensitive resin composition, photosensitive resin laminate, and method for forming protective pattern | 旭化成株式会社 | 2020-03-10 | — | — | CN | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |