SCHEMBL4645643

SCHEMBL4645643

CC(Cl)c1c2ccccc2cc2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 6/20 0.41
HSD17B10 Q99714 4/20 0.41
HIF1A Q16665 1/20 0.41
CYP1B1 Q16678 1/20 0.41
CYP1A2 P05177 5/20 0.40
CYP2A6 P11509 4/20 0.40
HTR2A P28223 1/20 0.40
HPGD P15428 2/20 0.39
KDM4E B2RXH2 2/20 0.39
MEN1 O00255 1/20 0.39
GLA P06280 1/20 0.39
CYP2C19 P33261 1/20 0.39
KMT2A Q03164 1/20 0.39
CYP3A4 P08684 1/20 0.38
ERBB2 P04626 1/20 0.38
FYN P06241 1/20 0.38
MAOA P21397 1/20 0.38
ACHE P22303 1/20 0.38
AHR P35869 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29853736 1.00 L3MBTL1 (0.45) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL6749119 0.83 CYP1A2 (0.36) L3MBTL1ALDH1A1HSD17B10CYP1A2CYP2A6
SCHEMBL40806 0.81 ALDH1A1 (0.44) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL4645977 0.81 L3MBTL1 (0.48) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL4642610 0.79 ALDH1A1 (0.42) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL29853842 0.79 ALDH1A1 (0.42) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL24200933 0.77 HTR2A (0.45) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL240650 0.77 UGT2B7 (0.47) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL4647817 0.77 ALDH1A1 (0.41) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1
SCHEMBL4642453 0.77 ALDH1A1 (0.41) L3MBTL1ALDH1A1HSD17B10HIF1ACYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
CN-103988313-A Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPROATION 2014-08-13 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
CN-1732883-A Cationically curable composition for dental use TOKUYAMA CORP (JP) 2006-02-15 CN disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
CN-1513884-A Photopolymerization initiator and composition capable of photopolymerization 株式会社德山 2004-07-21 CN disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed