Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.70 |
| ▸ | HPGD | P15428 | 3/20 | 0.70 |
| ▸ | GAA | P10253 | 2/20 | 0.70 |
| ▸ | MAOA | P21397 | 2/20 | 0.52 |
| ▸ | MAOB | P27338 | 1/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | GLA | P06280 | 4/20 | 0.47 |
| ▸ | POLB | P06746 | 3/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.46 |
| ▸ | CASP1 | P29466 | 2/20 | 0.46 |
| ▸ | CASP7 | P55210 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.46 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.46 |
| ▸ | NQO2 | P16083 | 1/20 | 0.46 |
| ▸ | DRD1 | P21728 | 1/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL321444 | 0.86 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL29446776 | 0.86 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL9669404 | 0.84 | KDM4E (0.56) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL3343659 | 0.83 | KDM4E (1.00) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL29446754 | 0.82 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL29385771 | 0.82 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL321679 | 0.82 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL320907 | 0.82 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL194585 | 0.80 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAMAOA | |
| SCHEMBL600275 | 0.80 | KDM4E (0.67) | KDM4EALDH1A1HPGDGAAMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| CN-119024642-A | Photocurable resin composition, application thereof and photosensitive dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-11-26 | — | — | CN | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-102844709-B | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2014-08-20 | — | — | CN | disclosed |
| CN-102844709-A | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-101449208-B | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORP. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-102144189-A | Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, conductive pattern, printed wiring board, lead frame, base, and method for manufacturing semiconductor package | ASAHI KASEI E MATERIALS CORP | 2011-08-03 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101568882-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101438208-A | Photosensitive resin composition | ASAHI KASEI EMD CORP (JP) | 2009-05-20 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |