⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21915928 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL6577437 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL18638043 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL19749861 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL18638041 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL3357474 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL18769020 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL334715 | 0.97 | ADRA2C (0.48) | — | |
| SCHEMBL16274766 | 0.92 | TP53 (0.42) | — | |
| SCHEMBL3211746 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10633755-B2 | Copper plating bath composition and method for deposition of copper | ATOTECH DEUTSCHLAND GMBH (DE) | 2020-04-28 | — | — | US | claimed |
| US-20180237932-A1 | COPPER PLATING BATH COMPOSITION AND METHOD FOR DEPOSITION OF COPPER | ATOTECH USA, LLC | 2018-08-23 | — | — | US | claimed |
| EP-3141633-B1 | COPPER PLATING BATH COMPOSITION | ATOTECH DEUTSCHLAND GMBH (DE) | 2018-05-02 | — | — | EP | claimed |
| EP-3141633-A1 | COPPER PLATING BATH COMPOSITION | ATOTECH Deutschland GmbH (DE) | 2017-03-15 | — | — | EP | claimed |
| CN-113493542-B | Conjugated diene polymer, process for producing the same, conjugated diene polymer composition, and rubber composition | 旭化成株式会社 | 2023-09-22 | — | — | CN | disclosed |
| US-10633755-B2 | Copper plating bath composition and method for deposition of copper | ATOTECH DEUTSCHLAND GMBH (DE) | 2020-04-28 | — | — | US | disclosed |
| US-20180237932-A1 | COPPER PLATING BATH COMPOSITION AND METHOD FOR DEPOSITION OF COPPER | ATOTECH USA, LLC | 2018-08-23 | — | — | US | disclosed |
| EP-3141633-B1 | COPPER PLATING BATH COMPOSITION | ATOTECH DEUTSCHLAND GMBH (DE) | 2018-05-02 | — | — | EP | disclosed |
| EP-2810960-B1 | POLYMERIZATION-CATALYST COMPOSITION FOR CONJUGATED-DIENE MONOMER | ASAHI CHEMICAL IND (JP) | 2017-08-09 | — | — | EP | disclosed |
| EP-3141633-A1 | COPPER PLATING BATH COMPOSITION | ATOTECH Deutschland GmbH (DE) | 2017-03-15 | — | — | EP | disclosed |
| US-9556285-B2 | Catalyst composition for polymerizing conjugated diene monomer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20140378620-A1 | CATALYST COMPOSITION FOR POLYMERIZING CONJUGATED DIENE MONOMER | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2014-12-25 | — | — | US | disclosed |
| US-20090281292-A1 | 10a-Azalide Compound | MEIJI SEIKA PHARMA CO., LTD. (JP) | 2009-11-12 | — | — | US | disclosed |
| EP-1985620-A1 | 10a-AZALIDE COMPOUND | TAISHO PHARMACEUTICAL CO., LTD (JP) | 2008-10-29 | — | — | EP | disclosed |
| US-6838526-B1 | Modified conjugated diene polymer and method of producing the same and rubber composition | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| EP-1099711-A2 | Modified conjugated diene polymer, method of producing it and rubber composition comprising the same | JSR Corporation (JP) | 2001-05-16 | — | — | EP | disclosed |
| US-4201707-A | Methine dyestuffs containing a phenyl azo group | BAYER AKTIENGESELLSCHAFT (DE) | 1980-05-06 | — | — | US | disclosed |
| US-4143228-A | RED SHADES | BAYER AKTIENGESELLSCHAFT (DE) | 1979-03-06 | — | — | US | disclosed |
| US-4138570-A | METHINE DYE | BAYER AKTIENGESELLSCHAFT (DE) | 1979-02-06 | — | — | US | disclosed |
| US-3975379-A | METHINE | BAYER AKTIENGESELLSCHAFT (DT) | 1976-08-17 | — | — | US | disclosed |