SCHEMBL335560

SCHEMBL335560

Nc1cc(Sc2ccc(O)c(N)c2)ccc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.52
HSD17B10 Q99714 6/20 0.52
ALOX15 P16050 6/20 0.52
ALOX12 P18054 3/20 0.52
HPGD P15428 3/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
MAPK1 P28482 2/20 0.52
GAA P10253 8/20 0.46
MAPT P10636 4/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
HTT P42858 2/20 0.46
KDM4E B2RXH2 2/20 0.46
RECQL P46063 2/20 0.46
USP2 O75604 2/20 0.46
PKM P14618 2/20 0.46
LMNA P02545 1/20 0.46
HSP90AA1 P07900 1/20 0.46
HIF1A Q16665 1/20 0.46
CA12 O43570 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31568748 1.00 ALDH1A1 (0.52) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL11190277 0.91 NR1H2 (0.61) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL17267878 0.91 ALOX15 (0.48) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL10728850 0.89 ALDH1A1 (0.53) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL11195937 0.87 ALDH1A1 (0.63) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL11196815 0.87 ALDH1A1 (0.42) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL6009396 0.87 ALDH1A1 (0.63) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL9771060 0.87 ALDH1A1 (0.45) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL11198490 0.87 MAPT (0.46) ALDH1A1HSD17B10ALOX15ALOX12HPGD
SCHEMBL11196256 0.87 MCL1 (0.53) ALDH1A1HSD17B10ALOX15ALOX12HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9975996-B2 Positive photosensitive resin composition and polyhydroxyamide resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-05-22 US claimed
US-20160185905-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-06-30 US claimed
EP-2011842-B1 PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF PI R & D CO LTD (JP) 2014-02-26 EP claimed
CN-101827880-B Precursor for heat-resistant resin and photosensitive resin composition containing the same ASAHI KASEI E MATERIALS CORP 2013-08-21 CN claimed
US-8349537-B2 Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof PI R&D CO., LTD. (JP) 2013-01-08 US claimed
CN-101395234-B Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof PI R & D CO LTD 2012-08-22 CN claimed
US-20110111351-A1 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof WIN MAW SOE 2011-05-12 US claimed
US-20090186295-A1 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof PI R&D CO., LTD. (JP) 2009-07-23 US claimed
CN-101395234-A Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof PI R & D CO LTD (JP) 2009-03-25 CN claimed
EP-2011842-A1 PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF PI R & D Co., Ltd. (JP) 2009-01-07 EP claimed
EP-1262509-B1 IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME PI R & D CO LTD (JP) 2007-01-10 EP claimed
US-6890626-B1 Imide-benzoxazole polycondensate and process for producing the same PI R&D CO., LTD. (JP) 2005-05-10 US claimed
EP-1262509-A1 IMIDE-BENZOXAZOLE POLYCONDENSATE AND PROCESS FOR PRODUCING THE SAME PI R & D Co., Ltd. (JP) 2002-12-04 EP claimed
EP-0083204-A2 2-Aminophenol derivatives and process for their preparation ONO PHARMACEUTICAL CO., LTD. (JP) 1983-07-06 EP claimed
CN-119955091-A Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2025-05-09 CN disclosed
CN-119439625-A Negative photosensitive resin composition, pattern forming method, cured coating film forming method, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2025-02-14 CN disclosed
CN-115418079-B Tough epoxy resin system and preparation method and application thereof 中国科学院山西煤炭化学研究所 2024-07-12 CN disclosed
US-4845183-A MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT HOECHST CELANESE CORPORATION (US) 1989-07-04 US disclosed
EP-0317942-A2 Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers HOECHST CELANESE CORPORATION (US) 1989-05-31 EP disclosed
EP-0083204-A2 2-Aminophenol derivatives and process for their preparation ONO PHARMACEUTICAL CO., LTD. (JP) 1983-07-06 EP disclosed