SCHEMBL3357906

SCHEMBL3357906

CN(C)CC(=O)N(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5264334 0.78
SCHEMBL2217350 0.78
SCHEMBL8186197 0.75 LMNA (0.39)
SCHEMBL8187320 0.75 ALDH1A1 (0.36)
SCHEMBL3283077 0.73 ALOX5 (0.45)
SCHEMBL13434931 0.73 LMNA (0.55)
SCHEMBL9912431 0.71
SCHEMBL13406583 0.71 LMNA (0.40)
SCHEMBL16172025 0.71 TDP1 (0.39)
SCHEMBL2111443 0.69 TDP1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6153793-A Method for producing an n-alkyl-alpha-dialkyl-aminoacethohydroxamic acid compound FUJI PHOTO FILM, LTD. (JP) 2000-11-28 US claimed
US-11259409-B2 Conductor substrate, wiring substrate and method for producing wiring substrate SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-02-22 US disclosed
WO-2019216425-A1 CONDUCTOR SUBSTRATE, WIRING SUBSTRATE, STRETCHABLE DEVICE, AND METHOD FOR MANUFACTURING WIRING SUBSTRATE 日立化成株式会社 (JP) 2019-11-14 WO disclosed
US-20190320527-A1 CONDUCTOR SUBSTRATE, WIRING SUBSTRATE AND METHOD FOR PRODUCING WIRING SUBSTRATE RESONAC CORPORATION (JP) 2019-10-17 US disclosed
US-9618788-B2 Optical film, polarizing plate and liquid crystal display using the same FUJIFILM CORPORATION (JP) 2017-04-11 US disclosed
US-9618788-B2 Optical film, polarizing plate and liquid crystal display using the same FUJIFILM CORPORATION (JP) 2017-04-11 US disclosed
CN-105474417-A Thermoelectric conversion device FUJIFILM CORP 2016-04-06 CN disclosed
US-20150253621-A1 OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY USING THE SAME FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-20150253621-A1 OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY USING THE SAME FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-20100085319-A1 ORGANIC ELECTROCONDUCTIVE POLYMER COATING LIQUID, ORGANIC ELECTROCONDUCTIVE POLYMER FILM, ELECTRIC CONDUCTOR, AND RESISTIVE FILM TOUCH PANEL FUJIFILM CORPORATION (JP) 2010-04-08 US disclosed
US-6153793-A Method for producing an n-alkyl-alpha-dialkyl-aminoacethohydroxamic acid compound FUJI PHOTO FILM, LTD. (JP) 2000-11-28 US disclosed
JP-2000026395-A PRODUCTION OF N-ALKYL-ALPHA- DIALKYLAMINOACETOHYDROXAMIC ACID COMPOUND FUJI PHOTO FILM CO LTD 2000-01-25 JP disclosed
JP-2000026394-A PRODUCTION OF N-ALKYL-ALPHA- DIALKYLAMINOACETOHYDROXAMIC ACID COMPOUND FUJI PHOTO FILM CO LTD 2000-01-25 JP disclosed