Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.40 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.38 |
| ▸ | NISCH | Q9Y2I1 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | KIF11 | P52732 | 1/20 | 0.32 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL34473434 | 0.74 | — | — | |
| SCHEMBL8471871 | 0.73 | MAOA (0.41) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL7414495 | 0.72 | TP53 (0.43) | TDP1MAPTMEN1NPC1GAA | |
| SCHEMBL11817394 | 0.70 | IDO1 (0.36) | MAPTNISCH | |
| SCHEMBL30874982 | 0.69 | MAPT (0.65) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL1790645 | 0.69 | ALDH1A1 (0.41) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| Hydrochloric Acid SCHEMBL11292811 | 0.65 | ALDH1A1 (0.41) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL3360445 | 0.65 | ALDH1A1 (0.41) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL31243465 | 0.65 | ALDH1A1 (0.41) | CYP2A6TDP1ALDH1A1HSD17B10TSHR | |
| SCHEMBL3071035 | 0.64 | HSD17B10 (0.44) | CYP2A6TDP1ALDH1A1HSD17B10TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3856195-A1 | METHODS AND COMPOSITIONS FOR TREATING AGING-ASSOCIATED IMPAIRMENTS USING CCR3-INHIBITORS | Alkahest, Inc. (US) | 2021-08-04 | — | — | EP | claimed |
| WO-2020069008-A1 | METHODS AND COMPOSITIONS FOR TREATING AGING-ASSOCIATED IMPAIRMENTS USING CCR3-INHIBITORS | ALKAHEST, INC. (US) | 2020-04-02 | — | — | WO | claimed |
| EP-3606525-A1 | METHODS AND COMPOSITIONS FOR TREATING AGING-ASSOCIATED IMPAIRMENTS USING CCR3-INHIBITORS | Alkahest, Inc. (US) | 2020-02-12 | — | — | EP | claimed |
| WO-2018187503-A1 | METHODS AND COMPOSITIONS FOR TREATING AGING-ASSOCIATED IMPAIRMENTS USING CCR3-INHIBITORS | ALKAHEST, INC. (US) | 2018-10-11 | — | — | WO | claimed |
| EP-0568993-B1 | Chemical amplification resist composition | KYOWA HAKKO KOGYO KK (JP) | 1998-08-12 | — | — | EP | claimed |
| US-5527659-A | PHOTOSENSITIVITY | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1996-06-18 | — | — | US | claimed |
| EP-0568993-A2 | Chemical amplification resist composition | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1993-11-10 | — | — | EP | claimed |
| EP-1267338-B1 | Optical recording medium, optical recording method and optical recording device | RICOH KK (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-1449890-B1 | Squarylium-metal chelate compounds and optical recording media | RICOH KK (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-7223521-B2 | Squarylium-metal chelate compounds and optical recording media | RICOH COMPANY, LTD. (JP) | 2007-05-29 | — | — | US | disclosed |
| US-6936323-B2 | Optical recording medium, and method and device using the same | RICOH COMPANY, LTD. (JP) | 2005-08-30 | — | — | US | disclosed |
| US-20040265645-A1 | Optical recording medium, and method and device using the same | RICOH COMPANY, LTD. (JP) | 2004-12-30 | — | — | US | disclosed |
| US-20040202098-A1 | Squarylium-metal chelate compounds and optical recording media | RICOH COMPANY, LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| EP-0568993-B1 | Chemical amplification resist composition | KYOWA HAKKO KOGYO KK (JP) | 1998-08-12 | — | — | EP | disclosed |
| US-5527659-A | PHOTOSENSITIVITY | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1996-06-18 | — | — | US | disclosed |
| EP-0568993-A2 | Chemical amplification resist composition | KYOWA HAKKO KOGYO CO., LTD. (JP) | 1993-11-10 | — | — | EP | disclosed |
| US-5236807-A | Negative, hydrazine compound | FUJI PHOTO FILM CO., LTD. (JP) | 1993-08-17 | — | — | US | disclosed |
| EP-0452811-A2 | Package of photosensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-10-23 | — | — | EP | disclosed |
| US-4769316-A | Method for restraining the formation of re-reversal negative image in direct positive silver halide photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1988-09-06 | — | — | US | disclosed |
| US-3943142-A | Dye intermediates and their preparation and use in the synthesis of methine dyes | EASTMAN KODAK COMPANY (US) | 1976-03-09 | — | — | US | disclosed |