⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL263362 | 0.76 | — | — | |
| SCHEMBL2043707 | 0.72 | — | — | |
| SCHEMBL8805495 | 0.68 | — | — | |
| SCHEMBL239230 | 0.67 | — | — | |
| SCHEMBL8746924 | 0.67 | — | — | |
| SCHEMBL28697858 | 0.64 | — | — | |
| SCHEMBL4921880 | 0.62 | — | — | |
| SCHEMBL19296362 | 0.62 | — | — | |
| SCHEMBL13912609 | 0.61 | — | — | |
| SCHEMBL24412331 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7932012-B2 | Polymer (polyimide or polybenzoxazole precursor) having an acid functional group, a compound having substituent(s) derived from an amine functional group as chain extender, a photoreactive compound, and a solvent; surface protecting film or interlayer dielectric for semiconductor device | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2011-04-26 | — | — | US | claimed |
| US-11021572-B2 | Photosensitive resin composition, cured product of same, interlayer insulating film, surface protective film and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20190161580-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF SAME, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM AND ELECTRONIC COMPONENT | HD MICROSYSTEMS, LTD. (JP) | 2019-05-30 | — | — | US | disclosed |
| US-9134608-B2 | Positive photosensitive resin composition, method for producing patterned cured film and electronic component | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-8765868-B2 | Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20120288798-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-8097386-B2 | Positive-type photosensitive resin composition, method for producing patterns, and electronic parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-7932012-B2 | Polymer (polyimide or polybenzoxazole precursor) having an acid functional group, a compound having substituent(s) derived from an amine functional group as chain extender, a photoreactive compound, and a solvent; surface protecting film or interlayer dielectric for semiconductor device | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20110027544-A1 | Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20100227126-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNS, AND ELECTRONIC PARTS | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-1004624-A1 | Latent mercaptan stabilizers for improved weatherability of clear halogen-containing polymer compositions | MORTON INTERNATIONAL, INC. (US) | 2000-05-31 | — | — | EP | disclosed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | disclosed |
| EP-0945764-A2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-09-29 | — | — | EP | disclosed |
| EP-0710885-B1 | Radiation sensitive composition | CLARIANT FINANCE BVI LTD (VG) | 1998-12-30 | — | — | EP | disclosed |
| US-5738972-A | BLEND OF BINDER, DISSOLUTION INHIBITOR, PHOTOSENSITIVR COMPOUND, BASE, PHENOLIC RESIN AND SOLVENT | HOECHST JAPAN LIMITED (JP) | 1998-04-14 | — | — | US | disclosed |
| EP-0742259-A1 | Latent mercaptans as multi-functional additives for halogen-containing polymer compositions | MORTON INTERNATIONAL, INC. (US) | 1996-11-13 | — | — | EP | disclosed |
| EP-0710885-A1 | Radiation sensitive composition | HOECHST JAPAN LIMITED (JP) | 1996-05-08 | — | — | EP | disclosed |
| EP-0541742-A1 | 2',5'-NUCLEOTIDE ANALOGS AS ANTIVIRAL AGENTS | PHARMACIA & UPJOHN S.p.A. (IT) | 1993-05-19 | — | — | EP | disclosed |
| WO-1992021691-A1 | 2',5'-NUCLEOTIDE ANALOGS AS ANTIVIRAL AGENTS | FARMITALIA CARLO ERBA S.R.L. (IT) | 1992-12-10 | — | — | WO | disclosed |