SCHEMBL3365711

SCHEMBL3365711

O=C(O)C1=CC2OC2CC1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OAT P04181 1/20 0.44
CES2 O00748 3/20 0.36
TSHR P16473 3/20 0.36
LMNA P02545 2/20 0.36
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
PMP22 Q01453 1/20 0.31
TFPI2 P48307 1/20 0.31
TP53 P04637 1/20 0.31
NFKB1 P19838 1/20 0.31
THPO P40225 1/20 0.31
ABAT P80404 1/20 0.31
GABRR1 P24046 2/20 0.31
GABRP O00591 1/20 0.31
GABRD O14764 1/20 0.31
GABRA1 P14867 1/20 0.31
GABRB1 P18505 1/20 0.31
GABRG2 P18507 1/20 0.31
GABRB3 P28472 1/20 0.31
GABRA5 P31644 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL6908251 0.93 OAT (0.43) OATCES2TSHRLMNACNR1
Di(Hydroxyethyl)Ether SCHEMBL10780761 0.86 OAT (0.38) OATCES2
SCHEMBL9815791 0.73 PKM (0.36)
SCHEMBL21569413 0.73 SLC6A2 (0.32)
SCHEMBL1375382 0.72 CES2 (0.32) CES2
SCHEMBL1376683 0.70 PKM (0.31)
SCHEMBL23781995 0.70
SCHEMBL21232956 0.70
SCHEMBL29615783 0.70
SCHEMBL4560836 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4545600-A1 CATIONIC PHOTOCURABLE COMPOSITION, PAINT, ARTICLE OF MANUFACTURE WITH PHOTOCURABLE COATING, AND INK Changzhou Zhengjie Intelligent Manufacture Technology Co., Ltd. (CN) 2025-04-30 EP claimed
US-11760891-B2 Infrared ray transmittance ink composition for inkjet, method for preparing a bezel pattern using the same, the bezel pattern using the same method and display panel comprising the bezel pattern LG CHEM, LTD. 2023-09-19 US claimed
US-11332631-B2 Film-printable ultraviolet-ray-curable ink composition, bezel pattern manufacturing method using same, bezel pattern manufactured according to same, and display substrate including same LG CHEM, LTD. 2022-05-17 US claimed
EP-3045508-B1 ADHESIVE AND LIGHT-EMITTING DEVICE DEXERIALS CORP (JP) 2018-11-14 EP claimed
EP-2302013-B1 ANISOTROPIC CONDUCTIVE ADHESIVE DEXERIALS CORP (JP) 2016-03-30 EP claimed
CN-104093783-A Polycarbonate resin composition and molded article IDEMITSU KOSAN CO 2014-10-08 CN claimed
EP-1956074-B1 n-PROPYL BROMIDE COMPOSITION KANEKO CHEMICAL CO LTD (JP) 2010-10-06 EP claimed
JP-63115881-A None JP disclosed
US-20250353955-A1 CATIONIC PHOTOCURABLE COMPOSITION, PAINT, ARTICLE WITH PHOTOCURED COATING, AND INK CHANGZHOU ZHENGJIE INTELLIGENT MANUFACTURE TECH CO LTD (CN) 2025-11-20 US disclosed
EP-4545600-A1 CATIONIC PHOTOCURABLE COMPOSITION, PAINT, ARTICLE OF MANUFACTURE WITH PHOTOCURABLE COATING, AND INK Changzhou Zhengjie Intelligent Manufacture Technology Co., Ltd. (CN) 2025-04-30 EP disclosed
WO-2024144011-A1 ULTRAVIOLET CURABLE INK COMPOSITION FOR FORMING BEZEL PATTERN WITH HIGH RELIABILITY (주)켐이 2024-07-04 WO disclosed
US-11760891-B2 Infrared ray transmittance ink composition for inkjet, method for preparing a bezel pattern using the same, the bezel pattern using the same method and display panel comprising the bezel pattern LG CHEM, LTD. 2023-09-19 US disclosed
CN-116478355-A Benzoxazine resin material for preparing three-dimensional object and using method thereof 清锋(北京)科技有限公司 2023-07-25 CN disclosed
EP-0768326-A1 THERMOSETTING COMPOSITION AND METHOD OF FORMING TOPCOATING FILM KANSAI PAINT CO., LTD. (JP) 1997-04-16 EP disclosed
CN-1122856-A Paper coating composition SUMITOMO CHEMICAL CO (JP) 1996-05-22 CN disclosed
EP-0421611-A1 Method for selective plugging of a zone in a well CONOCO INC. (US) 1991-04-10 EP disclosed
US-4972906-A Method for selective plugging of a zone in a well CONOCO INC. (US) 1990-11-27 US disclosed
US-4921047-A Composition and method for sealing permeable subterranean formations CONOCO INC. (US) 1990-05-01 US disclosed
JP-S63115881-A 2,6-EPOXY-3,4,5,6,11,12,13,14-OCTAHYDRO-2H-NAPHTHACENO(1,2-B)OXOCIN-9,16-DIONE DERIVATIVE SAGAMI CHEM RES CENTER 1988-05-20 JP disclosed
US-4309482-A MAGNETIC TAPE HAVING POLYEPOXIDE PROTECTIVE COATING MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1982-01-05 US disclosed