SCHEMBL3368876

SCHEMBL3368876

CC(=NO)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.56
MAPT P10636 4/20 0.56
CA9 Q16790 1/20 0.50
CASP3 P42574 1/20 0.48
GFER P55789 1/20 0.48
SENP8 Q96LD8 1/20 0.48
SENP7 Q9BQF6 1/20 0.48
SENP6 Q9GZR1 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.45
ALDH1A1 P00352 2/20 0.45
POLB P06746 1/20 0.45
WDR5 P61964 1/20 0.45
NPC1 O15118 3/20 0.44
RAB9A P51151 3/20 0.44
PPARG P37231 1/20 0.44
PPARA Q07869 1/20 0.44
CYP2D6 P10635 2/20 0.44
CYP1A2 P05177 1/20 0.44
HSD17B10 Q99714 1/20 0.44
KDM4E B2RXH2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4316450 1.00 SMN1; SMN2 (0.56) SMN1; SMN2MAPTCA9CASP3GFER
Biphenyl SCHEMBL27563074 0.93 CYP1A2 (0.50) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL13645704 0.91 CA9 (0.47) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL45278 0.85 LMNA (0.52) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL2736631 0.85 LMNA (0.52) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL257242 0.85 LMNA (0.52) SMN1; SMN2MAPTCA9CASP3GFER
Benzene SCHEMBL28280701 0.85 LMNA (0.52) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL11266105 0.83 LMNA (0.50) SMN1; SMN2MAPTCA9CASP3GFER
Water SCHEMBL4312372 0.83 LMNA (0.50) SMN1; SMN2MAPTCA9CASP3GFER
SCHEMBL11235227 0.83 LMNA (0.50) SMN1; SMN2MAPTCA9CASP3GFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117720433-A Preparation method and application of oxime carbonate compound 河南农业大学 2024-03-19 CN claimed
CN-112574135-B 4-aryl-5-thioether-2-difluoromethyl oxazole, and derivatives and synthesis method thereof 湖南工程学院 2022-09-23 CN claimed
CN-110606855-B Polysubstituted benzothienoisoquinoline, derivative and synthesis method thereof 湘潭大学 2022-03-18 CN claimed
CN-112574135-A 4-aryl-5-thioether-2-difluoromethyl oxazole, and derivatives and synthesis method thereof 湖南工程学院 2021-03-30 CN claimed
CN-110294758-A 2- replaces 5,6- dihydro-pyrazolo [5,1- α] isoquinolin, derivative and its synthetic method 湘潭大学 2019-10-01 CN claimed
CN-110204508-A 2,5- bis- replaces -1,2,4 thiadiazoles -3(2H)-thioketones, derivative and its synthetic method 湘潭大学 2019-09-06 CN claimed
CN-110078746-A A kind of 2- carbonyl thiazole bithiophene class compound and the preparation method and application thereof with luminescent properties 华南理工大学 2019-08-02 CN claimed
CN-117720433-A Preparation method and application of oxime carbonate compound 河南农业大学 2024-03-19 CN disclosed
CN-112574135-B 4-aryl-5-thioether-2-difluoromethyl oxazole, and derivatives and synthesis method thereof 湖南工程学院 2022-09-23 CN disclosed
CN-110078746-B 2-carbonyl thiazolothiophene compound with luminescent property and preparation method and application thereof 华南理工大学 2022-03-25 CN disclosed
CN-112574135-A 4-aryl-5-thioether-2-difluoromethyl oxazole, and derivatives and synthesis method thereof 湖南工程学院 2021-03-30 CN disclosed
CN-110294758-A 2- replaces 5,6- dihydro-pyrazolo [5,1- α] isoquinolin, derivative and its synthetic method 湘潭大学 2019-10-01 CN disclosed
CN-110204508-A 2,5- bis- replaces -1,2,4 thiadiazoles -3(2H)-thioketones, derivative and its synthetic method 湘潭大学 2019-09-06 CN disclosed
US-5703096-A ANTIDIABETIC AGENTS; ALDOSE REDUCTASE INHIBITOR SANKYO COMPANY, LIMITED (JP) 1997-12-30 US disclosed
EP-0708098-A1 Oxime derivatives, their preparation and their therapeutic use SANKYO COMPANY LIMITED (JP) 1996-04-24 EP disclosed
EP-0293058-B1 A positive photosensitive resinous composition NIPPON PAINT CO LTD (JP) 1995-08-30 EP disclosed
US-5213946-A POSITIVE TYPE, PHOTOSENSITIVE RESINOUS COMPOSITION NIPPON PAINT CO., LTD. (JP) 1993-05-25 US disclosed
EP-0519128-A1 A positive type, photosensitive resinous composition Nippon Paint Co., Ltd. (JP) 1992-12-23 EP disclosed
US-4869995-A Positive type photosensitive resinous composition NIPPON PAINT CO., LTD. (JP) 1989-09-26 US disclosed
EP-0293058-A2 A positive photosensitive resinous composition Nippon Paint Co., Ltd. (JP) 1988-11-30 EP disclosed