SCHEMBL336990

SCHEMBL336990

Nc1cc(C(=O)c2ccc(O)c(N)c2)ccc1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.53
GAA P10253 3/20 0.53
MAPK1 P28482 3/20 0.53
MAPT P10636 3/20 0.53
LMNA P02545 2/20 0.53
HTT P42858 2/20 0.53
L3MBTL1 Q9Y468 1/20 0.53
SLC22A6 Q4U2R8 1/20 0.50
SLC22A8 Q8TCC7 1/20 0.50
HSD17B10 Q99714 4/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
NPC1 O15118 1/20 0.48
USP2 O75604 1/20 0.48
RAB9A P51151 1/20 0.48
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA9 Q16790 1/20 0.48
ALOX15 P16050 2/20 0.48
HPGD P15428 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30786420 1.00 ALDH1A1 (0.53) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL6853626 0.92 GAA (0.47) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL11133333 0.90 MAPK1 (0.58) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL3015286 0.84 LCK (0.55) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL79989 0.84 KDM4E (0.64) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL29476052 0.84 KDM4E (0.64) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL21368975 0.84 ALDH1A1 (0.61) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL8814597 0.82 GAA (0.67) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL3287715 0.82 PRKCI (0.58) ALDH1A1GAAMAPK1MAPTLMNA
SCHEMBL9307729 0.82 KDM4E (0.61) ALDH1A1GAAMAPK1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 268 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119570027-B Colored end-capped photosensitive polymer, preparation method and application thereof, black photoresist and black matrix 上海明士华新材料有限公司 2025-04-18 CN claimed
CN-119633623-A Organic solvent composite nanofiltration membrane and preparation method and application thereof 苏州大学 2025-03-18 CN claimed
CN-119570027-A Colored end-capped photosensitive polymer, preparation method and application thereof, black photoresist and black matrix 上海明士华新材料有限公司 2025-03-07 CN claimed
WO-2024216910-A1 HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF 明士(北京)新材料开发有限公司 2024-10-24 WO claimed
WO-2022068900-A1 POSITIVE PHOTOSENSITIVE POLYAMIDE ESTER RESIN AND COMPOSITION USING SAME 明士(北京)新材料开发有限公司 2022-04-07 WO claimed
US-9975996-B2 Positive photosensitive resin composition and polyhydroxyamide resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-05-22 US claimed
US-20160185905-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-06-30 US claimed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
EP-4597225-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4596607-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-20250230283-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-17 US disclosed
EP-4398289-B1 CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND PROCESSING LIQUID FUJIFILM CORP (JP) 2025-07-02 EP disclosed
CN-119570027-B Colored end-capped photosensitive polymer, preparation method and application thereof, black photoresist and black matrix 上海明士华新材料有限公司 2025-04-18 CN disclosed
WO-1991016123-A1 POROUS POLYBENZOXAZOLE AND POLYBENZOTHIAZOLE MEMBRANES THE DOW CHEMICAL COMPANY (US) 1991-10-31 WO disclosed
US-5034026-A Polybenzazole polymers containing indan moieties THE DOW CHEMICAL COMPANY (US) 1991-07-23 US disclosed
EP-0431971-A2 Photosensitive composition and resin-encapsulated semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 1991-06-12 EP disclosed
US-5011753-A Polyamides Containing Hexafluoroisopropylidene Groups Which May Be Cured To Form Polybenzoxazoles HOECHST CELANESE CORPORATION (US) 1991-04-30 US disclosed
US-4939215-A CHEMICAL AND RADIATION RESISTANCE; AIRCRAFT, ELECTRONICS HOECHST CELANESE CORPORATION (US) 1990-07-03 US disclosed
US-4845183-A MOLDING MATERIALS; FOR DIELECTRICS OR COATING SOLUTIONS; TOUGHNESS, FLEXIBILITY, TRANSPARENT HOECHST CELANESE CORPORATION (US) 1989-07-04 US disclosed
EP-0317942-A2 Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers HOECHST CELANESE CORPORATION (US) 1989-05-31 EP disclosed