Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3367509 | 0.86 | ALDH1A1 (0.36) | ALDH1A1ALOX15 | |
| SCHEMBL54373 | 0.77 | KDM4E (0.32) | ALDH1A1 | |
| SCHEMBL3341005 | 0.76 | MAPK1 (0.32) | ALDH1A1 | |
| SCHEMBL296492 | 0.76 | MAPK1 (0.32) | ALDH1A1 | |
| SCHEMBL9244041 | 0.75 | KDM4E (0.31) | ALDH1A1 | |
| SCHEMBL28460876 | 0.74 | MAOA (0.32) | ALDH1A1 | |
| SCHEMBL10568358 | 0.71 | ALDH1A1 (0.37) | ALDH1A1ALOX15 | |
| SCHEMBL10564762 | 0.71 | ALDH1A1 (0.37) | ALDH1A1ALOX15 | |
| SCHEMBL20222460 | 0.69 | KDM4E (0.32) | ALDH1A1 | |
| SCHEMBL8023806 | 0.68 | KDM4E (0.30) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |