SCHEMBL3367509

SCHEMBL3367509

C=CC[Si](CCC1CC=CCC1)(OC)OC

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
ALOX15 P16050 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28460876 0.86 MAOA (0.32) ALDH1A1
SCHEMBL3370282 0.86 ALDH1A1 (0.34) ALDH1A1ALOX15
SCHEMBL20222460 0.80 KDM4E (0.32) ALDH1A1
SCHEMBL137566 0.76 MAPK1 (0.34) ALDH1A1
SCHEMBL297459 0.74 MAPK1 (0.33) ALDH1A1
SCHEMBL3344922 0.74 MAPK1 (0.33) ALDH1A1
SCHEMBL10568358 0.73 ALDH1A1 (0.37) ALDH1A1ALOX15
SCHEMBL11042030 0.73 MAPK1 (0.35)
SCHEMBL10564762 0.73 ALDH1A1 (0.37) ALDH1A1ALOX15
SCHEMBL11041752 0.72 MAPK1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed