SCHEMBL3372535

SCHEMBL3372535

CCN(CC)OO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propionic Acid SCHEMBL29986693 0.83 FFAR3 (0.53)
Potassium SCHEMBL10495332 0.72 TRPA1 (0.33)
SCHEMBL6846231 0.69 LMNA (0.32)
SCHEMBL4340641 0.69 ALDH1A1 (0.38)
SCHEMBL1683664 0.67
SCHEMBL972099 0.67
SCHEMBL28781241 0.65 ALDH1A1 (0.39)
SCHEMBL29092362 0.65
SCHEMBL17686899 0.65 ALDH1A1 (0.38)
SCHEMBL28532070 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114231237-B Industrial silane modified polyether elastic sealant and preparation method thereof 江西晨光新材料股份有限公司 2023-04-07 CN disclosed
CN-114231237-A Industrial silane modified polyether elastic sealant and preparation method thereof 江西晨光新材料股份有限公司 2022-03-25 CN disclosed
EP-1778777-B1 ANTISKINNING COMPOUND AND COMPOSITIONS CONTAINING THEM ARKEMA FRANCE (FR) 2010-11-10 EP disclosed
EP-1778777-A4 ANTISKINNING COMPOUND AND COMPOSITIONS CONTAINING THEM ARKEMA FRANCE (FR) 2009-04-15 EP disclosed
US-7253222-B2 Antiskinning compound and compositions containing them ARKEMA INC. (US) 2007-08-07 US disclosed
EP-1778777-A1 ANTISKINNING COMPOUND AND COMPOSITIONS CONTAINING THEM Arkema Inc. (US) 2007-05-02 EP disclosed
WO-2005121237-A1 ANTISKINNING COMPOUND AND COMPOSITIONS CONTAINING THEM ARKEMA INC. (US) 2005-12-22 WO disclosed
US-20050272841-A1 Antiskinning compound and compositions containing them ARKEMA FRANCE (FR) 2005-12-08 US disclosed
US-20050272842-A1 Antiskinning compound and compositions containing them ARKEMA FRANCE (FR) 2005-12-08 US disclosed
US-5834168-A CONTROLLED REPLENISHMENT OF PROCESSING SOLUTION, LOW VOLUME TANK, ADDING SOLID REPLENISHER TO SOLUTION, POLLUTION CONTROL EASTMAN KODAK COMPANY (US) 1998-11-10 US disclosed
EP-0856771-A1 Photographic image-forming process KODAK LIMITED (GB) 1998-08-05 EP disclosed