Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 5/20 | 0.38 |
| ▸ | GRIN3B | O60391 | 5/20 | 0.38 |
| ▸ | GRIN1 | Q05586 | 5/20 | 0.38 |
| ▸ | GRIN2A | Q12879 | 5/20 | 0.38 |
| ▸ | GRIN2B | Q13224 | 5/20 | 0.38 |
| ▸ | GRIN2C | Q14957 | 5/20 | 0.38 |
| ▸ | GRIN3A | Q8TCU5 | 5/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.38 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | STAT6 | P42226 | 1/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3801825 | 0.81 | GRIN2D (0.38) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL3996121 | 0.71 | — | — | |
| SCHEMBL3162831 | 0.69 | GRIN2D (0.38) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL14247631 | 0.69 | GRIN2D (0.38) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL7391547 | 0.69 | GRIN2D (0.39) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL18624167 | 0.67 | GRIN2D (0.33) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL13506157 | 0.67 | — | — | |
| SCHEMBL31254406 | 0.67 | SIGMAR1 (0.42) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL5820091 | 0.67 | GRIN2D (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4999768 | 0.65 | GRIN2D (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2006526672-A | — | — | 2006-11-24 | — | — | JP | claimed |
| US-20060180900-A1 | Organo-silsesquioxane polymers for forming low-k dielectrics | SILECS OY (FI) | 2006-08-17 | — | — | US | claimed |
| WO-2004090019-A1 | ORGANO-SILSESQUIOXANE POLYMERS FOR FORMING LOW-K DIELECTRICS | SILECS OY (FI) | 2004-10-21 | — | — | WO | claimed |
| CN-114055975-B | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2023-05-12 | — | — | CN | disclosed |
| US-20100317766-A1 | Optical Composite Material And Optical Device Using the Same | KONICA MINOLTA OPTO, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| EP-1711550-B1 | ADAMANTYL MONOMERS AND POLYMERS FOR LOW-K-DIELECTRIC APPLICATIONS | SILECS OY (FI) | 2010-12-01 | — | — | EP | disclosed |
| US-7622399-B2 | Method of forming low-k dielectrics using a rapid curing process | SILECS OY (FI) | 2009-11-24 | — | — | US | disclosed |
| US-7622399-B2 | Method of forming low-k dielectrics using a rapid curing process | SILECS OY (FI) | 2009-11-24 | — | — | US | disclosed |
| US-20090278254-A1 | Dielectric materials and methods for integrated circuit applications | SILECS OY (FI) | 2009-11-12 | — | — | US | disclosed |
| US-20090278254-A1 | Dielectric materials and methods for integrated circuit applications | SILECS OY (FI) | 2009-11-12 | — | — | US | disclosed |
| US-7514709-B2 | Organo-silsesquioxane polymers for forming low-k dielectrics | SILECS OY (FI) | 2009-04-07 | — | — | US | disclosed |
| US-20070063188-A1 | Low-k dielectric material | SILECS OY (FI) | 2007-03-22 | — | — | US | disclosed |
| US-20070063188-A1 | Low-k dielectric material | SILECS OY (FI) | 2007-03-22 | — | — | US | disclosed |
| EP-1711550-A1 | ADAMANTYL MONOMERS AND POLYMERS FOR LOW-K-DIELECTRIC APPLICATIONS | Silecs OY (FI) | 2006-10-18 | — | — | EP | disclosed |
| US-20060180900-A1 | Organo-silsesquioxane polymers for forming low-k dielectrics | SILECS OY (FI) | 2006-08-17 | — | — | US | disclosed |
| WO-2005061587-A1 | ADAMANTYL MONOMERS AND POLYMERS FOR LOW-K-DIELECTRIC APPLICATIONS | SILECS OY (FI) | 2005-07-07 | — | — | WO | disclosed |
| US-20050064726-A1 | Method of forming low-k dielectrics | SILECS OY (FI) | 2005-03-24 | — | — | US | disclosed |
| US-20050032357-A1 | Dielectric materials and methods for integrated circuit applications | SILECS OY (FI) | 2005-02-10 | — | — | US | disclosed |
| WO-2004090019-A1 | ORGANO-SILSESQUIOXANE POLYMERS FOR FORMING LOW-K DIELECTRICS | SILECS OY (FI) | 2004-10-21 | — | — | WO | disclosed |
| US-6348240-B1 | Methods for and products of modification and metallization of oxidizable surfaces, including diamond surfaces, by plasma oxidation | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY | 2002-02-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070063188-A1 | Low-k dielectric material | KCNH3, KCNH2, KCNN3 | GRIN2D 309/4885GRIN3B 486/4885GRIN1 366/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.