SCHEMBL3385301

SCHEMBL3385301

NOP(=O)(O)C(c1ccccc1)P(=O)(O)O

nearest known ligand 0.67

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.67
ACP3 P15309 12/20 0.43
ANPEP P15144 2/20 0.39
LAP3 P28838 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1499744 0.83 SRC (0.44) SRC
SCHEMBL4094661 0.81 SRC (1.00) SRCACP3
SCHEMBL27465781 0.79 SRC (0.64) SRCACP3
SCHEMBL4317431 0.72 ACP3 (0.67) ACP3ANPEPLAP3
SCHEMBL28251016 0.69 SRC (0.45) SRCACP3
SCHEMBL9301497 0.69 SRC (0.75) SRCACP3
Amino(Phenyl)Methylphosphonic Acid SCHEMBL5223252 0.69 SRC (0.60) SRCACP3ANPEPLAP3
Amino(Phenyl)Methylphosphonic Acid SCHEMBL7647462 0.69 SRC (0.60) SRCACP3ANPEPLAP3
Amino(Phenyl)Methylphosphonic Acid SCHEMBL233491 0.69 SRC (0.60) SRCACP3ANPEPLAP3
SCHEMBL232244 0.68 ACP3 (0.79) SRCACP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US claimed
US-9678430-B2 Composition and process for stripping photoresist from a surface including titanium nitride ENTEGRIS, INC. (US) 2017-06-13 US disclosed
US-20150168843-A1 COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE ENTEGRIS, INC. (US) 2015-06-18 US disclosed
EP-2850495-A1 COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE Entegris, Inc. (US) 2015-03-25 EP disclosed
WO-2013173738-A1 COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-11-21 WO disclosed
EP-1987095-B1 ALUMINIUM OXIDE-CONTAINING DISPERSION EVONIK DEGUSSA GMBH (DE) 2010-12-08 EP disclosed
US-7834076-B2 pyrogenic alumina particles of given surface area, that has been surface treated with organophosphonic acids and hydroxycarboxylic acids; improve the mechanical properties of a melamine-based laminate for use as protective wear resistant coating on furniture, floors; high solids EVONIK DEGUSSA GMBH (DE) 2010-11-16 US disclosed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
US-20090111919-A1 pyrogenic alumina particles of given surface area, that has been surface treated with organophosphonic acids and hydroxycarboxylic acids; improve the mechanical properties of a melamine-based laminate for use as protective wear resistant coating on furniture, floors; high solids EVONIK DEGUSSA GMBH (DE) 2009-04-30 US disclosed
EP-1987095-A1 ALUMINIUM OXIDE-CONTAINING DISPERSION Evonik Degussa GmbH (DE) 2008-11-05 EP disclosed
EP-1927889-A1 Lithographic printing plate precursor FUJIFILM Corporation (JP) 2008-06-04 EP disclosed
WO-2007096226-A1 ALUMINIUM OXIDE-CONTAINING DISPERSION EVONIK DEGUSSA GMBH (DE) 2007-08-30 WO disclosed
EP-1693427-A2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJI PHOTO FILM CO., LTD. (JP) 2006-08-23 EP disclosed
US-20060181591-A1 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJI PHOTO FILM CO., LTD. 2006-08-17 US disclosed
EP-0886547-B1 CLEANING WAFER SUBSTRATES OF METAL CONTAMINATION WHILE MAINTAINING WAFER SMOOTHNESS MALLINCKRODT BAKER INC (US) 2006-01-18 EP disclosed
US-6558873-B1 Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum FUJI PHOTO FILM CO., LTD. (JP) 2003-05-06 US disclosed
EP-1091251-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-04-11 EP disclosed
US-5989353-A RINSING NONOXIDIZED WAFER SUBSTRATE SURFACE WITH AQUEOUS MIXTURE COMPRISING METAL-FREE BASE AND LOW MOLECULAR WEIGHT ALKYLENE POLYHYDROXY COMPOUND WITHOUT USING HYDROGEN PEROXIDE OR OXIDE-REMOVER PRIOR TO FORMING INTEGRATED CIRCUIT MALLINCKRODT BAKER, INC. (US) 1999-11-23 US disclosed
US-5421897-A Applying liquid composition to surface contaminated with lead, solidifying into matrix which sequesters lead, removing matrix GRAWE JOHN (US) 1995-06-06 US disclosed
US-5277788-A Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article ALUMINUM COMPANY OF AMERICA (US) 1994-01-11 US disclosed