SCHEMBL3386532

SCHEMBL3386532

O=C(O)C(Cl)c1ccc(CCl)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.45
CA1 P00915 2/20 0.45
PTGS1 P23219 6/20 0.43
PTGS2 P35354 5/20 0.43
AKR1C3 P42330 3/20 0.40
CYP2C9 P11712 3/20 0.40
LMNA P02545 2/20 0.40
CXCR1 P25024 2/20 0.40
CXCR2 P25025 2/20 0.40
AKR1C2 P52895 2/20 0.40
ALB P02768 1/20 0.40
ESR1 P03372 1/20 0.40
ALOX5 P09917 1/20 0.40
RARB P10826 1/20 0.40
ADRB3 P13945 1/20 0.40
NFKB1 P19838 1/20 0.40
HTR2A P28223 1/20 0.40
NR1I3 Q14994 1/20 0.40
SLC22A6 Q4U2R8 1/20 0.40
CXCL8 P10145 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6069972 0.82 TSHR (0.53) PTGS1PTGS2AKR1C3CYP2C9LMNA
SCHEMBL11621015 0.81 SRC (0.54) CA2CA1PTGS1PTGS2AKR1C3
SCHEMBL6224603 0.78 PTGS2 (0.67) PTGS1PTGS2AKR1C3CYP2C9LMNA
SCHEMBL3792369 0.78 PTGS2 (0.67) PTGS1PTGS2AKR1C3CYP2C9LMNA
SCHEMBL1345506 0.78 PTGS2 (0.67) PTGS1PTGS2AKR1C3CYP2C9LMNA
SCHEMBL5283386 0.78 HSD17B10 (0.47) CA2CA1PTGS1PTGS2AKR1C3
SCHEMBL3739027 0.76 SRC (0.50) CA2CA1PTGS1CYP2C9LMNA
SCHEMBL2454097 0.76 CYP2C9 (0.47) CYP2C9LMNANFKB1TSHRBLM
SCHEMBL5325296 0.75 SRC (0.56) PTGS1PTGS2LMNACXCR1CXCR2
SCHEMBL664900 0.75 SRC (0.56) PTGS1PTGS2LMNACXCR1CXCR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1072580-B1 PROCESS FOR PRODUCING CHLOROMETHYLPHENYLACETIC ACID IHARA CHEMICAL IND CO (JP) 2010-12-01 EP disclosed
US-6414186-B1 REACTING METHYLPHENYLACETIC ACID WITH CHLORINE GAS, IN INERT SOLVENT, UNDER IRRADIATION WITH LIGHT OR IN PRESENCE OF RADICAL INITIATOR IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 2002-07-02 US disclosed
EP-1072580-A1 PROCESS FOR PRODUCING CHLOROMETHYLPHENYLACETIC ACID Ihara Nikkei Chemical Industry Co., Ltd. (JP) 2001-01-31 EP disclosed