Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKT1 | P31749 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | EGFR | P00533 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | JAK1 | P23458 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 2/20 | 0.36 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10347642 | 0.82 | AKT1 (0.61) | AKT1CYP3A4KDM4EMEN1KMT2A | |
| SCHEMBL8865435 | 0.80 | AKT1 (0.50) | AKT1CYP3A4KDM4EMEN1KMT2A | |
| SCHEMBL5144374 | 0.78 | KDM4E (0.41) | KDM4EMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL28031897 | 0.76 | AKT1 (0.68) | AKT1CYP3A4KDM4EMEN1KMT2A | |
| SCHEMBL9496010 | 0.76 | ALDH1A1 (0.61) | CYP3A4KDM4EKMT2AHPGDALDH1A1 | |
| SCHEMBL3479933 | 0.75 | AKT1 (0.55) | AKT1CYP3A4KDM4EMEN1KMT2A | |
| SCHEMBL18640549 | 0.75 | ALDH1A1 (0.48) | KDM4EHPGDALDH1A1HSD17B10MAPT | |
| SCHEMBL14918787 | 0.74 | ALDH1A1 (0.64) | AKT1CYP3A4KDM4EKMT2AHPGD | |
| Vinyl Ether SCHEMBL8041439 | 0.74 | AKT1 (0.52) | AKT1CYP3A4KDM4EMEN1KMT2A | |
| SCHEMBL22323631 | 0.73 | TSHR (0.57) | AKT1CYP3A4KDM4EKMT2AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| US-7135273-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-14 | — | — | US | claimed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | claimed |
| JP-10115911-A | — | — | None | — | — | JP | disclosed |
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| CN-100566509-C | Formation method, device and the manufacture method thereof of film figure, electro-optical device | SEIKO EPSON CORP (JP) | 2009-12-02 | — | — | CN | disclosed |
| CN-1285100-C | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2006-11-15 | — | — | CN | disclosed |
| US-7135273-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-14 | — | — | US | disclosed |
| CN-1816255-A | Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus | SEIKO EPSON CORP (JP) | 2006-08-09 | — | — | CN | disclosed |
| CN-1574218-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| US-20040259040-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-23 | — | — | US | disclosed |
| US-6306556-B1 | PATTERN FORMING MATERIAL COMPRISING COPOLYMER INCLUDING FIRST GROUP FOR GENERATING BASE THROUGH IRRADIATION WITH ENERGY BEAM AND SECOND GROUP HAVING ACIDIC PROPERTY | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-10-23 | — | — | US | disclosed |
| US-20010024768-A1 | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-09-27 | — | — | US | disclosed |
| EP-1124158-A1 | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-08-16 | — | — | EP | disclosed |
| US-6120974-A | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-09-19 | — | — | US | disclosed |
| US-5965325-A | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1999-10-12 | — | — | US | disclosed |
| EP-0860743-A2 | Pattern forming method and semiconductor processing method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |
| JP-H10115911-A | PHOTOSENSITIVE LITHOGRAPHIC PRINTING MASTER PLATE, AND ITS PLATE MAKING METHOD | TORAY IND INC | 1998-05-06 | — | — | JP | disclosed |
| EP-0791856-A2 | Pattern forming material and pattern forming method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-27 | — | — | EP | disclosed |