Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.36 |
| ▸ | CD81 | P60033 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4857167 | 0.82 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL6298835 | 0.79 | — | — | |
| SCHEMBL7745860 | 0.79 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| SCHEMBL27517822 | 0.78 | CYP17A1 (0.32) | CYP17A1CYP19A1 | |
| Acrylic Acid SCHEMBL6298175 | 0.78 | — | — | |
| SCHEMBL4742222 | 0.78 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL22615686 | 0.77 | NAAA (0.39) | CYP17A1CYP19A1 | |
| SCHEMBL22615685 | 0.77 | NAAA (0.39) | CYP17A1CYP19A1 | |
| SCHEMBL39900 | 0.76 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL5390024 | 0.75 | CYP17A1 (0.37) | CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2106573-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | Fujifilm Corporation (JP) | 2009-10-07 | — | — | EP | disclosed |
| WO-2008093856-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | WO | disclosed |