Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Methyl Ester SCHEMBL6303295 | 0.89 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6298832 | 0.85 | CYP17A1 (0.33) | CYP17A1CYP19A1 | |
| Maleic Anhydride SCHEMBL843362 | 0.85 | CYP17A1 (0.38) | CYP17A1CYP19A1 | |
| SCHEMBL7745860 | 0.85 | CYP17A1 (0.41) | CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6303616 | 0.83 | ALDH1A1 (0.39) | CYP17A1CYP19A1 | |
| Methacrylic Acid SCHEMBL6298173 | 0.83 | CYP17A1 (0.32) | CYP17A1CYP19A1 | |
| SCHEMBL4742222 | 0.83 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL685522 | 0.83 | — | — | |
| SCHEMBL686055 | 0.82 | CYP17A1 (0.42) | CYP17A1CYP19A1 | |
| SCHEMBL14519225 | 0.82 | HSD11B1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2462 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250388769-A1 | Ink Composition, Package Structure and Semiconductor Device | HANGZHOU FIRST APPLIED MAT CO LTD (CN) | 2025-12-25 | — | — | US | claimed |
| EP-4530321-A1 | INK COMPOSITION, PACKAGING STRUCTURE, AND SEMICONDUCTOR DEVICE | Hangzhou First Applied Material Co., Ltd. (CN) | 2025-04-02 | — | — | EP | claimed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118930715-A | Acrylic resin polymer and preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2024-11-12 | — | — | CN | claimed |
| CN-118625599-A | Photosensitive resin composition, photosensitive dry film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2024-09-10 | — | — | CN | claimed |
| CN-115160495-B | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2024-05-14 | — | — | CN | claimed |
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-117659263-A | Weather-resistant room-temperature-degradable water-soluble photosensitive resin, application and preparation method thereof | 中国地质大学（武汉） | 2024-03-08 | — | — | CN | claimed |
| WO-2024007741-A1 | INK COMPOSITION, PACKAGING STRUCTURE, AND SEMICONDUCTOR DEVICE | 杭州福斯特应用材料股份有限公司 | 2024-01-11 | — | — | WO | claimed |
| CN-114544803-B | HPLC analysis method for photoresist resin monomer acrylic ester compound | 河北凯诺中星科技有限公司 | 2023-12-26 | — | — | CN | claimed |
| EP-1411389-A1 | Photoresists with hydroxylated, photoacid-cleavable groups | E.I. du Pont de Nemours and Company (US) | 2004-04-21 | — | — | EP | claimed |
| WO-2004022612-A1 | PHOTORESISTS, FLUOROPOLYMERS AND PROCESSES FOR 157 NM MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-03-18 | — | — | WO | claimed |
| WO-2004014960-A2 | FLUORINATED MONOMERS, FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-19 | — | — | WO | claimed |
| WO-2004014964-A2 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-19 | — | — | WO | claimed |
| US-6692888-B1 | TERPOLYMER OF SUCH AS 2-METHYLADAMANTANYL METHACRYLATE, METHACRYLONITRILE AND ALPHA-BUTYROLACTONE METHACRYLATE; SHORT WAVELENGTH IMAGING; PLASMA ETCHANT RESISTANCE | SHIPLEY COMPANY, L.L.C. | 2004-02-17 | — | — | US | claimed |
| WO-2004011509-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-05 | — | — | WO | claimed |
| US-20030215742-A1 | Novel copolymers and photoresist compositions comprising same | BARCLAY GEORGE G (US) | 2003-11-20 | — | — | US | claimed |
| WO-2003040827-A1 | FLUORINATED POLYMERS HAVING ESTER GROUPS AND PHOTORESISTS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-05-15 | — | — | WO | claimed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | claimed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |