SCHEMBL3395919

SCHEMBL3395919

O=C=NC(=O)c1cccc(C(=O)N=C=O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.43
ATM Q13315 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
FURIN P09958 1/20 0.38
MET P08581 1/20 0.37
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA6 P23280 1/20 0.35
CA9 Q16790 1/20 0.35
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
PARP1 P09874 1/20 0.34
PKM P14618 1/20 0.34
DAO P14920 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5555845 0.96 TDP1 (0.40) L3MBTL1ATMTDP1FURINMET
Butanedione SCHEMBL28856348 0.92 FURIN (0.38) L3MBTL1ATMTDP1FURINMET
SCHEMBL28864381 0.86 PARP1 (0.53) L3MBTL1MEN1KMT2APARP1TSHR
SCHEMBL9117144 0.86 CES2 (0.57) L3MBTL1CES2CES1HDAC6MEN1
SCHEMBL10792089 0.86 PARP1 (0.53) L3MBTL1MEN1KMT2APARP1PKM
SCHEMBL4092403 0.86 PARP1 (0.53) TDP1HDAC8HDAC6MEN1KMT2A
SCHEMBL27511887 0.86 LOXL2 (0.49) CA12CA1CA2CA9MEN1
SCHEMBL1789230 0.85
SCHEMBL11139683 0.84 CES1 (0.46) L3MBTL1ATMTDP1CA12CA1
SCHEMBL84542 0.84 CES1 (0.46) L3MBTL1ATMTDP1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118344531-A Solvent-free bio-based photo-curing prepolymer and preparation method and application thereof 华南农业大学 2024-07-16 CN claimed
WO-2023045900-A1 FAST-DEGRADING ESTER COMPOSITION AND PREPARATION METHOD THEREFOR 山东联欣环保科技有限公司 2023-03-30 WO claimed
US-20120121901-A1 WATER BASED BOND SEWING THREAD AND METHOD OF MANUFACTURING THE SAME LEE BONG-KYU (KR) 2012-05-17 US claimed
CN-120020194-A Adhesive, adhesive sheet and portable electronic device 日东电工株式会社 2025-05-20 CN disclosed
CN-119894954-A System and method for enclosing a PFAS 巴斯夫欧洲公司 2025-04-25 CN disclosed
CN-119775567-A Polymers containing fluorene skeletons 信越化学工业株式会社 2025-04-08 CN disclosed
CN-119431712-A Organosilicon multi-component block copolymer and preparation method and application thereof 华南理工大学 2025-02-14 CN disclosed
CN-119192561-A Preparation method of melting point-adjustable polybutylece lactam copolymer 上海簇睿低碳能源技术有限公司 2024-12-27 CN disclosed
CN-118414397-A Adhesive composition and adhesive sheet 日东电工株式会社 2024-07-30 CN disclosed
CN-113174413-B Method for synthesizing polybutyl lactam by enzyme catalysis 华东理工大学 2024-07-16 CN disclosed
WO-2024036983-A1 POLISHING PAD 湖北鼎汇微电子材料有限公司 2024-02-22 WO disclosed
EP-0117924-A2 Aromatic copolyamides containing ether linkages THE DOW CHEMICAL COMPANY (US) 1984-09-12 EP disclosed
US-4465760-A Production of relief images or resist images by a negative-working method BASF AKTIENGESELLSCHAFT (DE) 1984-08-14 US disclosed
US-4456679-A Production of relief images or resist images by a positive-working method BASF AKTIENGESELLSCHAFT (DE) 1984-06-26 US disclosed
EP-0101976-A2 Negative process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-03-07 EP disclosed
EP-0101586-A2 Process for the manufacture of plates for intaglio printing using plastic printing foils BASF Aktiengesellschaft (DE) 1984-02-29 EP disclosed
EP-0101587-A2 Positive process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-02-29 EP disclosed
US-4410684-A Aromatic copolyamides containing ether linkages THE UPJOHN COMPANY (US) 1983-10-18 US disclosed
US-4039520-A PHOTOGRAPHY KONISHIROKU PHOTO INDUSTRY CO., LTD. (JA) 1977-08-02 US disclosed
US-3981865-A BACTERICIDES TOYAMA CHEMICAL CO., LTD. (JA) 1976-09-21 US disclosed