Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 4/20 | 0.39 |
| ▸ | CDC25B | P30305 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.36 |
| ▸ | DNMT3L | Q9UJW3 | 1/20 | 0.36 |
| ▸ | DNMT3A | Q9Y6K1 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 4/20 | 0.35 |
| ▸ | PTPRC | P08575 | 4/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | BLM | P54132 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | S100A4 | P26447 | 3/20 | 0.35 |
| ▸ | APAF1 | O14727 | 2/20 | 0.35 |
| ▸ | TDP2 | O95551 | 2/20 | 0.35 |
| ▸ | PLIN1 | O60240 | 2/20 | 0.35 |
| ▸ | MAOA | P21397 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30773549 | 1.00 | PTPN1 (0.39) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL3399109 | 0.86 | PTPN1 (0.39) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL3398101 | 0.86 | PTPN1 (0.39) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| Hydrochloric Acid SCHEMBL8031975 | 0.85 | PTPN1 (0.38) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL9774897 | 0.83 | PTPN1 (0.39) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL819290 | 0.83 | PTPN1 (0.39) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL3951332 | 0.81 | PTPN1 (0.62) | PTPN1CDC25BMEN1KMT2AIDO1 | |
| SCHEMBL3135592 | 0.81 | TDP2 (0.32) | TDP2NSD2 | |
| SCHEMBL13155865 | 0.80 | HTR6 (0.41) | PTPN1CDC25BMEN1KMT2AMAPT | |
| SCHEMBL13324452 | 0.80 | PTPN1 (0.37) | PTPN1CDC25BMEN1KMT2AIDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-1190665-A | — | — | None | — | — | JP | disclosed |
| CN-117866205-A | Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-117866204-A | Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-116430671-A | Photoresist composition and photoetching process | 上海飞凯材料科技股份有限公司 | 2023-07-14 | — | — | CN | disclosed |
| US-11049812-B2 | Semiconductor devices and methods of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2021-06-29 | — | — | US | disclosed |
| US-20200286832-A1 | SEMICONDCUTOR DEVICES AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-09-10 | — | — | US | disclosed |
| US-10665545-B2 | Semiconductor devices, semiconductor packages and methods of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-05-26 | — | — | US | disclosed |
| US-20200091073-A1 | SEMICONDCUTOR DEVICES, SEMICONDCUTOR PACKAGES AND METHODS OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-03-19 | — | — | US | disclosed |
| US-9778569-B2 | Positive photosensitive resin composition, method for producing film using same, and electronic component | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-10-03 | — | — | US | disclosed |
| US-20160266491-A1 | Positive Photosensitive Resin Composition, Method for Producing Film Using Same, and Electronic Component | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-09-15 | — | — | US | disclosed |
| WO-1990013058-A1 | HEXAHYDROXYBENZOPHENONE COMPOUNDS AS SENSITIVITY ENHANCERS FOR RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-11-01 | — | — | WO | disclosed |
| US-4957846-A | PHOTORESISTS, PHOTOLITHOGRAPHY, PRINTED CIRCUITS | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-09-18 | — | — | US | disclosed |
| WO-1990007538-A1 | SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES | OLIN HUNT SPECIALTY PRODUCTS INC. (US) | 1990-07-12 | — | — | WO | disclosed |
| EP-0328824-A2 | Sulfonic acid esters useful as sensitizers for positive resists | International Business Machines Corporation (US) | 1989-08-23 | — | — | EP | disclosed |
| US-4853315-A | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1989-08-01 | — | — | US | disclosed |
| JP-H01190665-A | SULFONATE ESTER AND POSITIVE RESISTS CONTAINING THE SULFONATE ESTER | INTERNATL BUSINESS MACH CORP <IBM> | 1989-07-31 | — | — | JP | disclosed |
| US-4818658-A | Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product | SHIPLEY COMPANY INC. (US) | 1989-04-04 | — | — | US | disclosed |
| US-4797345-A | POSITIVE WORKING PHOTORESISTS, MIXTURES WITH RESINS | OLIN HUNT SPECIALTY PRODUCTS, INC. (US) | 1989-01-10 | — | — | US | disclosed |
| EP-0297825-A1 | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters and their use in light-sensitive mixtures | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1989-01-04 | — | — | EP | disclosed |
| EP-0147596-A2 | A positive lithographic resist composition | International Business Machines Corporation (US) | 1985-07-10 | — | — | EP | disclosed |