Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.43 |
| ▸ | LTA4H | P09960 | 2/20 | 0.38 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.38 |
| ▸ | HRH1 | P35367 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.34 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6698560 | 0.91 | TAAR1 (0.46) | TAAR1LTA4HPLA2G2AHRH1AOC3 | |
| SCHEMBL305461 | 0.79 | TAAR1 (0.43) | TAAR1LTA4HPLA2G2AHRH1MAOA | |
| SCHEMBL6696698 | 0.78 | TAAR1 (0.44) | TAAR1LTA4HPLA2G2AHRH1AOC3 | |
| SCHEMBL329176 | 0.77 | LTA4H (0.43) | TAAR1LTA4HSMN1; SMN2TSHRKCNA3 | |
| SCHEMBL1482787 | 0.74 | LTA4H (0.39) | LTA4HTSHRKCNA3 | |
| SCHEMBL6694296 | 0.73 | DRD2 (0.43) | TAAR1 | |
| SCHEMBL10863992 | 0.73 | TAAR1 (0.38) | TAAR1LTA4HPLA2G2AMAOA | |
| SCHEMBL706489 | 0.73 | KCNA3 (0.44) | TAAR1LTA4HSMN1; SMN2TSHRKCNA3 | |
| SCHEMBL329378 | 0.73 | KCNA3 (0.44) | TAAR1LTA4HSMN1; SMN2TSHRKCNA3 | |
| SCHEMBL9323575 | 0.73 | HDAC3 (0.40) | TAAR1LTA4HSMN1; SMN2TSHRKCNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220019146-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-01-20 | — | — | US | disclosed |
| US-20210278767-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-09 | — | — | US | disclosed |
| EP-3842863-A1 | FILM FORMATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-30 | — | — | EP | disclosed |
| US-20210165327-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-03 | — | — | US | disclosed |
| EP-3816728-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-05-05 | — | — | EP | disclosed |
| WO-2020121949-A1 | POLYIMIDE RESIN COMPOSITION AND POLYIMIDE FILM | 三菱瓦斯化学株式会社 | 2020-06-18 | — | — | WO | disclosed |
| US-20200166844-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-05-28 | — | — | US | disclosed |
| EP-3627224-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMING METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2020-03-25 | — | — | EP | disclosed |
| CN-109791916-A | Resin combination, semiconductor wiring layer laminates and semiconductor device | 日立化成株式会社 | 2019-05-21 | — | — | CN | disclosed |
| US-8404564-B2 | Adhesive film for semiconductor, composite sheet, and method for producing semiconductor chip using them | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20100112783-A1 | ADHESIVE FILM FOR SEMICONDUCTOR, COMPOSITE SHEET, AND METHOD FOR PRODUCING SEMICONDUCTOR CHIP USING THEM | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-05-06 | — | — | US | disclosed |
| EP-2139027-A1 | ADHESIVE FILM FOR SEMICONDUCTOR, COMPOSITE SHEET, AND METHOD FOR PRODUCING SEMICONDUCTOR CHIP USING THEM | Hitachi Chemical Company, Ltd. (JP) | 2009-12-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210165327-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | RALA, MRPL19, MRPL9 | TAAR1 3671/4885LTA4H 899/4885PLA2G2A 125/4885 |
| US-20220019146-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | LIPA, MLLT3, EPB41L2 | TAAR1 2908/4885LTA4H 963/4885PLA2G2A 46/4885 |
| US-20200166844-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN | LIPA, LCLAT1, LCAT | TAAR1 3438/4885LTA4H 1076/4885PLA2G2A 155/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.