Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.48 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.46 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.46 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | XBP1 | P17861 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.43 |
| ▸ | NTSR1 | P30989 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13225806 | 1.00 | ALDH1A1 (0.61) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL10519642 | 0.85 | ALDH1A1 (0.65) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL8070812 | 0.85 | ALDH1A1 (0.75) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL16518811 | 0.83 | ALDH1A1 (0.63) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL16360067 | 0.83 | ALDH1A1 (0.63) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL3378961 | 0.83 | ALDH1A1 (0.63) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL74463 | 0.83 | ALDH1A1 (0.63) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL3620395 | 0.81 | ALDH1A1 (0.61) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL10028337 | 0.81 | ALDH1A1 (0.61) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G | |
| SCHEMBL13676859 | 0.81 | ALDH1A1 (0.61) | ALDH1A1LMNAKDM4EAPOBEC3AAPOBEC3G |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8431323-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8426101-B2 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20100112482-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-05-06 | — | — | US | disclosed |
| US-7470499-B2 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2008-12-30 | — | — | US | disclosed |
| US-20070141512-A1 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20060073408-A1 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | NEC CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| US-6270942-B1 | PHOTOSENSITVE POLYMER CONTAINING NORBORNENE UNITS, MALEIC ANHYDRIDE UNITS AND UNSATURATED ESTER | SAMSUNG ELECTRONICS CO., LTD (KR) | 2001-08-07 | — | — | US | disclosed |
| WO-2001055141-A1 | AZINE DERIVATIVES AS PESTICIDES | SYNGENTA LIMITED (GB) | 2001-08-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100112482-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | ZYX, FOXO1, CAPZA1 | ALDH1A1 211/4885LMNA 567/4885KDM4E 1954/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.