SCHEMBL3415542

SCHEMBL3415542

Cc1cccc(C(=O)c2nc(N)nc(N)n2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PARP1 P09874 1/20 0.53
▸ RAB9A P51151 1/20 0.53
▸ POLB P06746 1/20 0.49
▸ FGFR1 P11362 1/20 0.46
▸ SRC P12931 1/20 0.46
▸ FGFR2 P21802 1/20 0.46
▸ FGFR4 P22455 1/20 0.46
▸ FGFR3 P22607 1/20 0.46
▸ KDR P35968 1/20 0.46
▸ HDAC8 Q9BY41 1/20 0.46
▸ HDAC6 Q9UBN7 1/20 0.46
▸ MAPK13 O15264 1/20 0.46
▸ MAPK12 P53778 1/20 0.46
▸ MAPK11 Q15759 1/20 0.46
▸ MAPK14 Q16539 1/20 0.46
▸ MAPT P10636 2/20 0.46
▸ KMT2A Q03164 2/20 0.46
▸ ALDH1A1 P00352 1/20 0.45
▸ GRM5 P41594 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7088783 0.78 ALDH1A1 (0.52) PARP1RAB9APOLBMAPTKMT2A
SCHEMBL29503529 0.78 PARP1 (0.68) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL186545 0.78 PARP1 (0.68) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL15264066 0.76 PARP1 (0.65) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL9973084 0.75 PBRM1 (0.69) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL13781004 0.74 POLB (0.43) PARP1POLBHDAC8HDAC6MAPT
SCHEMBL822041 0.74 PARP1 (0.63) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL6652575 0.74 MAPK13 (0.60) PARP1POLBHDAC8HDAC6MAPK13
SCHEMBL16441847 0.73 GRM5 (0.66) RAB9APOLBHDAC8HDAC6KMT2A
SCHEMBL31367010 0.72 POLB (0.60) PARP1POLBHDAC8HDAC6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361605-B2 Photosensitive resin composition, dry film, and processed product made using the same MITSUI CHEMICALS, INC. (JP) 2013-01-29 — — US disclosed
US-20100116532-A1 PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, AND PROCESSED PRODUCT MADE USING THE SAME MITSUI CHEMICALS, INC. (JP) 2010-05-13 — — US disclosed
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