Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SNCA | P37840 | 2/20 | 0.63 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.41 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.41 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.41 |
| ▸ | LAP3 | P28838 | 3/20 | 0.39 |
| ▸ | ANPEP | P15144 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphine SCHEMBL28019064 | 0.97 | SNCA (0.61) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| SCHEMBL29918368 | 0.97 | SNCA (0.65) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Water SCHEMBL28174086 | 0.95 | SNCA (0.59) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Ammonia Solution, Strong SCHEMBL28815793 | 0.95 | SNCA (0.59) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| SCHEMBL989761 | 0.95 | SNCA (0.63) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Bromide SCHEMBL163158 | 0.95 | SNCA (0.67) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Iodide SCHEMBL159922 | 0.95 | SNCA (0.63) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Fluoride Ion SCHEMBL585089 | 0.95 | SNCA (0.63) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL494 | 0.95 | SNCA (0.63) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 | |
| Fluoride Ion SCHEMBL6664234 | 0.92 | SNCA (0.61) | SNCAHIF1ACYP1A2EPHX1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3894512-B1 | COMPOSITION AND METHOD FOR SELECTIVELY ETCHING RUTHENIUM AND/OR COPPER | ENTEGRIS INC (US) | 2025-12-24 | — | — | EP | claimed |
| EP-4429802-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | Entegris, Inc. (US) | 2024-09-18 | — | — | EP | claimed |
| EP-4419619-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | Entegris, Inc. (US) | 2024-08-28 | — | — | EP | claimed |
| CN-118234830-A | Selective wet etching composition and method | 恩特格里斯公司 | 2024-06-21 | — | — | CN | claimed |
| CN-118234560-A | Membrane for removing anionic material | 恩特格里斯公司 | 2024-06-21 | — | — | CN | claimed |
| CN-118085973-A | Post-chemical mechanical polishing formulations and methods of use thereof | 恩特格里斯公司 | 2024-05-28 | — | — | CN | claimed |
| US-11845917-B2 | Compositions and methods for post-CMP cleaning of cobalt substrates | ENTEGRIS, INC. (US) | 2023-12-19 | — | — | US | claimed |
| WO-2023086276-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | ENTEGRIS, INC. (US) | 2023-05-19 | — | — | WO | claimed |
| US-20230149916-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | ENTEGRIS, INC. | 2023-05-18 | — | — | US | claimed |
| WO-2023069409-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. (US) | 2023-04-27 | — | — | WO | claimed |
| US-20160340620-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ADVANCED TECH MATERIALS (US) | 2016-11-24 | — | — | US | claimed |
| WO-2015116818-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-06 | — | — | WO | claimed |
| US-20130161840-A1 | STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF-LINE OPERATIONS | DYNALOY LLC (US) | 2013-06-27 | — | — | US | claimed |
| US-8440389-B2 | Stripper solutions effective for back-end-of-line operations | DYNALOY, LLC (US) | 2013-05-14 | — | — | US | claimed |
| US-20100221503-A1 | STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF-LINE OPERATIONS | DYNALOY LLC (US) | 2010-09-02 | — | — | US | claimed |
| WO-2010008877-A1 | STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF LINE OPERATIONS | DYNALOY LLC (US) | 2010-01-21 | — | — | WO | claimed |
| US-6316575-B1 | MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2001-11-13 | — | — | US | claimed |
| EP-0673959-B1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEM CORP (JP) | 1998-10-28 | — | — | EP | claimed |
| US-5527875-A | Process for producing aromatic polycarbonate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-06-18 | — | — | US | claimed |
| EP-0673959-A1 | Process for producing aromatic polycarbonate | Mitsubishi Chemical Corporation (JP) | 1995-09-27 | — | — | EP | claimed |