Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 5/20 | 0.55 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.54 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.54 |
| ▸ | CA1 | P00915 | 3/20 | 0.52 |
| ▸ | CA2 | P00918 | 3/20 | 0.52 |
| ▸ | TYR | P14679 | 2/20 | 0.47 |
| ▸ | TLR2 | O60603 | 1/20 | 0.43 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.43 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29956865 | 1.00 | ERN1 (0.55) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL3432503 | 0.82 | ERN1 (0.48) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL1981753 | 0.82 | ERN1 (0.48) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL4072726 | 0.82 | TYR (0.53) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL2948542 | 0.80 | GABRA1 (0.39) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL725385 | 0.78 | GABRA1 (0.52) | CA1CA2TYRTDP1LMNA | |
| SCHEMBL5473286 | 0.78 | LMNA (0.42) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL29472311 | 0.78 | LMNA (0.42) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL11782846 | 0.78 | ALDH1A1 (0.56) | ERN1TRIM24TRIM33CA1CA2 | |
| SCHEMBL8218747 | 0.77 | KDM4E (0.66) | CA1CA2LMNAKDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4587669-B2 | — | — | 2010-11-24 | — | — | JP | claimed |
| JP-2005509662-A | — | — | 2005-04-14 | — | — | JP | claimed |
| CN-1589136-A | Pharmaceutical and cosmetic compositions containing aromatic aldehydes bearing oxygen-containing groups | CUTANIX CORP (US) | 2005-03-02 | — | — | CN | claimed |
| EP-1443915-A1 | PHARMACEUTICAL AND COSMETIC COMPOSITIONS CONTAINING OXY GROUP-BEARING AROMATIC ALDEHYDES | Cutanix Corporation (US) | 2004-08-11 | — | — | EP | claimed |
| US-20030157154-A1 | Compositions containing hydroxy aromatic aldehydes and their use in treatments | CUTANIX CORPORATION | 2003-08-21 | — | — | US | claimed |
| WO-2003043621-A1 | PHARMACEUTICAL AND COSMETIC COMPOSITIONS CONTAINING OXY GROUP-BEARING AROMATIC ALDEHYDES | CUTANIX CORPORATION (US) | 2003-05-30 | — | — | WO | claimed |
| WO-2023070114-A2 | REVERSIBLE LYSINE COVALENT MODIFIERS OF EGFR AND USES THEREOF | TERREMOTO BIOSCIENCES, INC. (US) | 2023-04-27 | — | — | WO | disclosed |
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-8969629-B2 | Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-03-03 | — | — | US | disclosed |
| CN-102973417-A | Pharmaceutical and cosmetic compositions containing oxy group-bearing aromatic aldehydes | CUTANIX CORP | 2013-03-20 | — | — | CN | disclosed |
| US-20120282546-A1 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2505576-A1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-10-03 | — | — | EP | disclosed |
| US-6984716-B2 | Phosphorus-containing compound | CHANG CHUN PLASTICS CO., LTD. (TW) | 2006-01-10 | — | — | US | disclosed |
| CN-1589136-A | Pharmaceutical and cosmetic compositions containing aromatic aldehydes bearing oxygen-containing groups | CUTANIX CORP (US) | 2005-03-02 | — | — | CN | disclosed |
| EP-1443915-A1 | PHARMACEUTICAL AND COSMETIC COMPOSITIONS CONTAINING OXY GROUP-BEARING AROMATIC ALDEHYDES | Cutanix Corporation (US) | 2004-08-11 | — | — | EP | disclosed |
| US-20040077821-A1 | Flame retarding resin composition | CHANG CHUN PLASTICS CO., LTD. (TW) | 2004-04-22 | — | — | US | disclosed |
| US-20040077825-A1 | Phosphorus-containing compound | CHANG CHUN PLASTICS CO., LTD. (TW) | 2004-04-22 | — | — | US | disclosed |
| US-20030157154-A1 | Compositions containing hydroxy aromatic aldehydes and their use in treatments | CUTANIX CORPORATION | 2003-08-21 | — | — | US | disclosed |
| WO-2003043621-A1 | PHARMACEUTICAL AND COSMETIC COMPOSITIONS CONTAINING OXY GROUP-BEARING AROMATIC ALDEHYDES | CUTANIX CORPORATION (US) | 2003-05-30 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030157154-A1 | Compositions containing hydroxy aromatic aldehydes and their use in treatments | TYR, HRH1, HRH2 | ERN1 4830/4885TRIM24 3252/4885TRIM33 2340/4885 |
| US-20120282546-A1 | CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | CROCC, XRCC6, CHEK1 | ERN1 750/4885TRIM24 3558/4885TRIM33 4512/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.