Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.36 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.36 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.36 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.36 |
| ▸ | GRIA4 | P48058 | 2/20 | 0.34 |
| ▸ | TOP2A | P11388 | 1/20 | 0.32 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | SRC | P12931 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | CXCR1 | P25024 | 2/20 | 0.31 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8354255 | 0.86 | CHRNB2 (0.38) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL8356434 | 0.85 | CHRNB2 (0.37) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL8603894 | 0.83 | CHRNB2 (0.36) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL8605601 | 0.83 | ALOX5 (0.41) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL6323246 | 0.82 | ALOX5 (0.39) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL27486779 | 0.77 | LMNA (0.41) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL6330663 | 0.76 | GRIA4 (0.36) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL8358478 | 0.76 | ALOX5 (0.46) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL6329644 | 0.76 | ALOX5 (0.38) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 | |
| SCHEMBL8356404 | 0.74 | ALOX5 (0.45) | ALOX5CHRNB2CHRNB4CHRNA3CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2138897-B1 | CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN | FUJITSU LTD (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-8821761-B2 | Antistatic agent, antistatic film and articles coated with antistatic film | SHOWA DENKO K.K. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20100009296-A1 | MATERIAL FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING CONDUCTIVE ANTIREFLECTION FILM, METHOD FOR FORMING RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2138897-A1 | MATERIAL FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND MAGNETIC HEAD | Fujitsu Limited (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-2031025-A2 | Antistatic agent, antistatic film and articles coated with antistatic film | Showa Denko K.K. (JP) | 2009-03-04 | — | — | EP | disclosed |
| EP-2019129-A2 | Antistatic agent, antistatic film and articles coated with antistatic film | Showa Denko K.K. (JP) | 2009-01-28 | — | — | EP | disclosed |
| EP-1818369-A2 | Antistatic agent, antistatic film and articles coated with antistatic film | Showa Denko Kabushiki Kaisha (JP) | 2007-08-15 | — | — | EP | disclosed |
| US-20070181857-A1 | Antistatic agent, antistatic film and articles coated with antistatic film | SHOWA DENKO K.K. | 2007-08-09 | — | — | US | disclosed |
| EP-0459255-B1 | Method for suppression of electrification | HITACHI LTD (JP) | 1998-03-18 | — | — | EP | disclosed |
| US-5589270-A | Processed substrate obtained by a process for effecting suppression of electrification | HITACHI, LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| US-5437893-A | Method for suppression of electrification | HITACHI, LTD (JP) | 1995-08-01 | — | — | US | disclosed |
| US-5256454-A | Method for suppression of electrification | HITACHI, LTD. (JP) | 1993-10-26 | — | — | US | disclosed |
| EP-0459255-A2 | Method for suppression of electrification | HITACHI, LTD. (JP) | 1991-12-04 | — | — | EP | disclosed |