Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 4/20 | 0.46 |
| ▸ | ASIC3 | Q9UHC3 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | PIKFYVE | Q9Y2I7 | 3/20 | 0.39 |
| ▸ | PAK4 | O96013 | 3/20 | 0.39 |
| ▸ | TTBK1 | Q5TCY1 | 3/20 | 0.39 |
| ▸ | PTGES2 | Q9H7Z7 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | PAK1 | Q13153 | 1/20 | 0.38 |
| ▸ | PKN1 | Q16512 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12391039 | 0.89 | ASIC3 (0.50) | MAPTASIC3LMNAL3MBTL1HAO1 | |
| SCHEMBL20717544 | 0.82 | APP (0.59) | APPMAPTHAO1PTGES2 | |
| SCHEMBL12711667 | 0.80 | APP (0.47) | APPMAPTASIC3LMNAL3MBTL1 | |
| SCHEMBL14268091 | 0.80 | ASIC3 (0.49) | MAPTASIC3LMNAL3MBTL1HAO1 | |
| SCHEMBL18561130 | 0.78 | MAPT (0.53) | APPMAPTASIC3LMNAL3MBTL1 | |
| SCHEMBL700507 | 0.78 | HTT (0.46) | APPMAPTASIC3LMNAL3MBTL1 | |
| SCHEMBL6865029 | 0.78 | KIF11 (0.45) | MAPTASIC3LMNAL3MBTL1HAO1 | |
| SCHEMBL1571249 | 0.78 | ASIC3 (0.44) | APPMAPTASIC3LMNAL3MBTL1 | |
| SCHEMBL13692776 | 0.78 | ASIC3 (0.44) | MAPTASIC3LMNAL3MBTL1HAO1 | |
| SCHEMBL8620900 | 0.78 | ASIC3 (0.44) | MAPTASIC3LMNAL3MBTL1HAO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119330839-A | Method for preparing p-aminophenylacetylene | 金泰旭化学技术(无锡)有限公司 | 2025-01-21 | — | — | CN | claimed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995061-B | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115220305-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-114995061-A | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-119330839-A | Method for preparing p-aminophenylacetylene | 金泰旭化学技术(无锡)有限公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-119330839-A | Method for preparing p-aminophenylacetylene | 金泰旭化学技术(无锡)有限公司 | 2025-01-21 | — | — | CN | disclosed |
| US-4219679-A | HIGH CONVERSION | GULF RESEARCH & DEVELOPMENT COMPANY (US) | 1980-08-26 | — | — | US | disclosed |
| US-4216341-A | Selective hydrogenation of certain nitroaromatic hydroxy substituted acetylenes over a heterogeneous RuS2 catalyst | GULF RESEARCH & DEVELOPMENT COMPANY (US) | 1980-08-05 | — | — | US | disclosed |
| US-4139561-A | RUTHENIUM HYDROGENATION CATALYST | GULF RESEARCH & DEVELOPMENT COMPANY (US) | 1979-02-13 | — | — | US | disclosed |