Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6416782 | 0.95 | MEN1 (0.33) | — | |
| SCHEMBL8398106 | 0.80 | ALDH1A1 (0.33) | LMNAPOLBALDH1A1 | |
| SCHEMBL1225485 | 0.80 | LMNA (0.32) | LMNAPOLBALDH1A1 | |
| SCHEMBL775517 | 0.80 | — | — | |
| SCHEMBL76505 | 0.79 | ALDH1A1 (0.41) | LMNAPOLBALDH1A1 | |
| SCHEMBL12553878 | 0.78 | POLB (0.36) | LMNAPOLBALDH1A1 | |
| SCHEMBL28360693 | 0.78 | MEN1 (0.33) | — | |
| SCHEMBL65810 | 0.77 | — | — | |
| SCHEMBL775370 | 0.76 | — | — | |
| SCHEMBL16708624 | 0.76 | LMNA (0.54) | LMNAPOLBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-7820369-B2 | Method for patterning a low activation energy photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-10-26 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7193023-B2 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-03-20 | — | — | US | disclosed |
| US-20050245706-A1 | 6-Trifluoromethyl-2 vinyloxy-4-oxatricyclo[4.2.1.03,7]noname-5-one, and polymer compound | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050123852-A1 | Method for patterning a low activation energy photoresist | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050124774-A1 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-06-09 | — | — | US | disclosed |