Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23200420 | 0.81 | TP53 (0.31) | — | |
| SCHEMBL26111852 | 0.79 | LMNA (0.42) | LMNA | |
| SCHEMBL20597633 | 0.79 | — | — | |
| SCHEMBL23161023 | 0.79 | LMNA (0.46) | LMNA | |
| SCHEMBL3388540 | 0.78 | LMNA (0.55) | LMNA | |
| SCHEMBL2776589 | 0.78 | TSHR (0.31) | — | |
| SCHEMBL36100 | 0.77 | TSHR (0.45) | LMNA | |
| SCHEMBL8397022 | 0.77 | LMNA (0.44) | LMNA | |
| SCHEMBL1958622 | 0.77 | TSHR (0.39) | LMNA | |
| SCHEMBL5011169 | 0.76 | FAAH (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-8030419-B2 | Process for producing polymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-7820369-B2 | Method for patterning a low activation energy photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-10-26 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7193023-B2 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-03-20 | — | — | US | disclosed |
| US-20050123852-A1 | Method for patterning a low activation energy photoresist | GLOBALFOUNDRIES U.S. INC. | 2005-06-09 | — | — | US | disclosed |
| US-20050124774-A1 | Low activation energy photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2005-06-09 | — | — | US | disclosed |