⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL822476 | 0.88 | — | — | |
| SCHEMBL6545564 | 0.78 | TSHR (0.46) | — | |
| SCHEMBL16470051 | 0.77 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL3467973 | 0.77 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL22471876 | 0.74 | SMN1; SMN2 (0.32) | — | |
| SCHEMBL12855780 | 0.73 | TSHR (0.32) | — | |
| SCHEMBL439901 | 0.73 | TSHR (0.36) | — | |
| SCHEMBL26525830 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL1957206 | 0.73 | TSHR (0.38) | — | |
| SCHEMBL1780373 | 0.73 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111788260-A | Hard coating film | 株式会社LG化学 | 2020-10-16 | — | — | CN | claimed |
| EP-2338939-B1 | CONDUCTIVE POLYMER SOLUTION, CONDUCTIVE COATING FILM AND INPUT DEVICE | SHINETSU POLYMER CO (JP) | 2019-01-16 | — | — | EP | claimed |
| US-20130331476-A1 | SILOXANE HARD COATING RESIN | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2013-12-12 | — | — | US | claimed |
| WO-2023188856-A1 | INK COMPOSITION, LIGHT-BLOCKING MEMBER AND IMAGE DISPLAY DEVICE | ナトコ株式会社 | 2023-10-05 | — | — | WO | disclosed |
| CN-112585513-B | Laminate comprising horizontally aligned liquid crystal cured film | 住友化学株式会社 | 2023-01-24 | — | — | CN | disclosed |
| CN-111093972-B | Laminate and device | 住友化学株式会社 | 2022-10-28 | — | — | CN | disclosed |
| CN-114815029-A | Optical laminate | 住友化学株式会社 | 2022-07-29 | — | — | CN | disclosed |
| CN-114786940-A | Laminate and optical laminate | 住友化学株式会社 | 2022-07-22 | — | — | CN | disclosed |
| CN-114764158-A | Light absorption anisotropic plate | 住友化学株式会社 | 2022-07-19 | — | — | CN | disclosed |
| CN-111065669-B | Curable composition | 住友化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-110799865-B | Optical film | 住友化学株式会社 | 2022-06-10 | — | — | CN | disclosed |
| US-20140349222-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-20130331476-A1 | SILOXANE HARD COATING RESIN | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2013-12-12 | — | — | US | disclosed |
| US-8540904-B2 | Composition for ultraviolet absorbent substance and ultraviolet absorbent substance comprising same | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130168829-A1 | PHENOLIC RESIN COMPOSITION, AND METHODS FOR MANUFACTURING CURED RELIEF PATTERN AND SEMICONDUCTOR | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20120313058-A1 | COMPOSITION FOR ULTRAVIOLET ABSORBENT SUBSTANCE AND ULTRAVIOLET ABSORBENT SUBSTANCE COMPRISING SAME | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120220681-A1 | PHOTO-CURABLE TRANSPARENT RESIN COMPOSITION | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2012-08-30 | — | — | US | disclosed |
| US-8197053-B2 | Active energy beam-curable ink and ink-jet recording method using active energy beam-curable ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20100143606-A1 | Photocation-Curable Ink and Ink-Jet Recording Method by Using Photocation-Curable Ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100079568-A1 | Active Energy Beam-Curable Ink and Ink-Jet Recording Method Using Active Energy Beam-Curable Ink | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2010-04-01 | — | — | US | disclosed |