⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3455958 | 0.88 | — | — | |
| SCHEMBL6545564 | 0.78 | TSHR (0.46) | — | |
| SCHEMBL362262 | 0.77 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL2572807 | 0.76 | — | — | |
| SCHEMBL12855780 | 0.73 | TSHR (0.32) | — | |
| SCHEMBL439901 | 0.73 | TSHR (0.36) | — | |
| SCHEMBL26525830 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL1780373 | 0.73 | TSHR (0.31) | — | |
| SCHEMBL15233829 | 0.72 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL26073685 | 0.71 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114901433-A | Polymer bonded abrasive article comprising a continuous polymer matrix and method of making the same | 3M创新有限公司 | 2022-08-12 | — | — | CN | disclosed |
| US-10418521-B2 | Method for manufacturing substrate and method for manufacturing light emitting element using same | TORAY INDUSTRIES, INC. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-20180309022-A1 | METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME | TORAY INDUSTRIES, INC. (JP) | 2018-10-25 | — | — | US | disclosed |
| EP-3369780-A1 | METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME | Toray Industries, Inc. (JP) | 2018-09-05 | — | — | EP | disclosed |
| US-9856340-B2 | Photocurable fluorinated polymer composition | ASAHI GLASS COMPANY, LIMITED (JP) | 2018-01-02 | — | — | US | disclosed |
| US-9134608-B2 | Positive photosensitive resin composition, method for producing patterned cured film and electronic component | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| EP-2468816-B1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | ASAHI GLASS CO LTD (JP) | 2014-11-26 | — | — | EP | disclosed |
| US-8360565-B2 | Material for an inkjet ink composition and inkjet ink composition | RICOH COMPANY, LIMITED (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20120288798-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT | HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| EP-2468816-A1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | Asahi Glass Company, Limited (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120149798-A1 | PHOTOCURABLE FLUORINATED POLYMER COMPOSITION | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-06-14 | — | — | US | disclosed |
| EP-2387596-A2 | EPOXY RESIN COMPOSITION | 3M Innovative Properties Company (US) | 2011-11-23 | — | — | EP | disclosed |
| US-20110282010-A1 | EPOXY RESIN COMPOSITION | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2011-11-17 | — | — | US | disclosed |
| US-20110060100-A1 | MATERIAL FOR AN INKJET INK COMPOSITION AND INKJET INK COMPOSITION | RICOH COMPANY LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |