SCHEMBL3456473

SCHEMBL3456473

O=C(OCCS(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.53
LMNA P02545 2/20 0.50
MAPK1 P28482 1/20 0.44
HIF1A Q16665 1/20 0.44
SLC6A2 P23975 1/20 0.44
SLC6A3 Q01959 1/20 0.44
KMT2A Q03164 1/20 0.44
ALDH1A1 P00352 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
POLB P06746 1/20 0.42
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
HSD11B1 P28845 1/20 0.41
TSHR P16473 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
F2 P00734 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14336043 0.81 TDP1 (0.59) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL6115054 0.80 TDP1 (0.58) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL27785317 0.79 TDP1 (0.66) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL4465657 0.78 HTR6 (0.44) TDP1LMNAKMT2AALDH1A1SMN1; SMN2
SCHEMBL2608651 0.77 TDP1 (0.63) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL28052900 0.77 LMNA (0.60) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL27256658 0.76 TDP1 (0.61) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL27510780 0.76 TDP1 (0.61) TDP1LMNAMAPK1HIF1ASLC6A2
SCHEMBL3454237 0.75 KMT2A (0.43) KMT2AALDH1A1SMN1; SMN2POLBTSHR
SCHEMBL3454429 0.75 SMN1; SMN2 (0.40) TDP1LMNAALDH1A1SMN1; SMN2HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA TDP1 4248/4885LMNA 3254/4885MAPK1 156/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.