SCHEMBL3454237

SCHEMBL3454237

O=C(OCCS(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)C1CCCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.43
MEN1 O00255 1/20 0.43
CYP2C19 P33261 1/20 0.43
MAPT P10636 2/20 0.42
ALDH1A1 P00352 3/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
ENPP3 O14638 3/20 0.42
ENPP1 P22413 3/20 0.42
ENPP2 Q13822 2/20 0.42
PKM P14618 2/20 0.40
RAB9A P51151 2/20 0.40
NPC1 O15118 1/20 0.40
EPHX2 P34913 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
FKBP1A P62942 1/20 0.40
POLB P06746 2/20 0.40
ATM Q13315 1/20 0.40
ELANE P08246 1/20 0.39
USP2 O75604 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3756015 0.78 MEN1 (0.44) KMT2AMEN1CYP2C19MAPTALDH1A1
SCHEMBL13721711 0.76 CYP2C19 (0.39) KMT2AMEN1CYP2C19MAPTALDH1A1
SCHEMBL16205017 0.76 FKBP1A (0.40) KMT2AMEN1CYP2C19MAPTALDH1A1
SCHEMBL3456473 0.75 TDP1 (0.53) KMT2AALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL2472018 0.74 POLB (0.49) KMT2AMEN1CYP2C19ALDH1A1L3MBTL1
SCHEMBL3454233 0.73 ALDH1A1 (0.41) KMT2AMEN1CYP2C19MAPTALDH1A1
SCHEMBL12938396 0.73 ALDH1A1 (0.42) KMT2AMEN1MAPTALDH1A1ENPP3
SCHEMBL3454498 0.72 ALDH1A1 (0.51) KMT2ACYP2C19ALDH1A1ENPP3ENPP1
SCHEMBL3503104 0.72 FKBP1A (0.54) CYP2C19MAPTALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL4465657 0.72 HTR6 (0.44) KMT2AMAPTALDH1A1PKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA KMT2A 2407/4885MEN1 4014/4885CYP2C19 1351/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.