Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.62 |
| ▸ | SLC9A1 | P19634 | 8/20 | 0.60 |
| ▸ | RAB9A | P51151 | 3/20 | 0.57 |
| ▸ | MAPT | P10636 | 2/20 | 0.57 |
| ▸ | NPC1 | O15118 | 1/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | GLA | P06280 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | MGAM | O43451 | 1/20 | 0.53 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | SI | P14410 | 1/20 | 0.53 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.53 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.51 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.50 |
| ▸ | APAF1 | O14727 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4346795 | 0.89 | SLC9A1 (0.63) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL27267352 | 0.85 | SLC9A1 (0.63) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL2490329 | 0.85 | SLC9A1 (0.58) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL2800642 | 0.83 | SLC9A1 (0.58) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| Sulfuric Acid SCHEMBL31557704 | 0.80 | SLC9A1 (0.83) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL7672465 | 0.79 | SLC9A1 (0.68) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL2936169 | 0.79 | SLC9A1 (0.68) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL14796568 | 0.78 | SLC9A1 (0.79) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL9340128 | 0.77 | SLC9A1 (0.59) | EGLN3SLC9A1RAB9AMAPTNPC1 | |
| SCHEMBL6885340 | 0.77 | EGLN3 (1.00) | EGLN3SLC9A1RAB9AMAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240213475-A1 | ADDITIVE FOR ELECTROLYTE, ELECTROLYTE FOR RECHARGEABLE LITHIUM BATTERY, AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2024-06-27 | — | — | US | disclosed |
| US-20240213475-A1 | ADDITIVE FOR ELECTROLYTE, ELECTROLYTE FOR RECHARGEABLE LITHIUM BATTERY, AND RECHARGEABLE LITHIUM BATTERY INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2024-06-27 | — | — | US | disclosed |
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-8480920-B2 | Chemical mechanical polishing aqueous dispersion, method of preparing the same, chemical mechanical polishing aqueous dispersion preparation kit, and chemical mechanical polishing method | JSR CORPORATION (JP) | 2013-07-09 | — | — | US | disclosed |
| US-8470195-B2 | Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| EP-2017318-B1 | Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method | JSR CORP (JP) | 2012-05-30 | — | — | EP | disclosed |
| US-20100252774-A1 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, METHOD OF PREPARING THE SAME, CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION PREPARATION KIT, AND CHEMICAL MECHANICAL POLISHING METHOD | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2017318-A2 | Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method | JSR Corporation (JP) | 2009-01-21 | — | — | EP | disclosed |
| US-20080318427-A1 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION PREPARATION SET, METHOD OF PREPARING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, AND CHEMICAL MECHANICAL POLISHING METHOD | JSR CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| EP-1724317-B1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR CORP (JP) | 2008-10-22 | — | — | EP | disclosed |
| EP-1700893-B1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR CORP (JP) | 2008-10-01 | — | — | EP | disclosed |
| US-20060276041-A1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR CORPORATION (JP) | 2006-12-07 | — | — | US | disclosed |
| EP-1724317-A1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR Corporation (JP) | 2006-11-22 | — | — | EP | disclosed |
| US-20060201914-A1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| EP-1700893-A1 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | JSR Corporation (JP) | 2006-09-13 | — | — | EP | disclosed |