SCHEMBL3462915

SCHEMBL3462915

CCCCCCC1(COS(C)(=O)=O)COC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 2/20 0.39
CA1 P00915 8/20 0.33
CA2 P00918 8/20 0.33
CA9 Q16790 7/20 0.33
CA12 O43570 3/20 0.33
CA7 P43166 3/20 0.33
CA14 Q9ULX7 3/20 0.33
CA3 P07451 2/20 0.33
CA4 P22748 2/20 0.33
CA6 P23280 2/20 0.33
CA5A P35218 2/20 0.33
CA5B Q9Y2D0 2/20 0.33
RECQL P46063 2/20 0.33
TSHR P16473 2/20 0.33
GLA P06280 1/20 0.33
HPGD P15428 1/20 0.33
MAPK1 P28482 1/20 0.33
EPHX2 P34913 1/20 0.33
BLM P54132 1/20 0.33
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3463622 0.86 PRKCA (0.32) PRKCATSHRKDM4EUSP2ALDH1A1
SCHEMBL1039373 0.79 TSHR (0.34) PRKCATSHRKDM4EUSP2ALDH1A1
SCHEMBL11727987 0.76 TSHR (0.40) TSHRALDH1A1
SCHEMBL28774497 0.75 ALDH1A1 (0.37) TSHRALDH1A1
SCHEMBL15130198 0.75 PRKCA (0.31) PRKCA
SCHEMBL13822823 0.74 PRKCA (0.44) PRKCAALDH1A1
SCHEMBL14481104 0.74 KDM4E (0.32) TSHRKDM4EUSP2ALDH1A1LMNA
SCHEMBL27651602 0.73 TSHR (0.36) TSHR
SCHEMBL5945176 0.73 TSHR (0.36) TSHR
SCHEMBL2899698 0.73 TSHR (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2204388-B1 PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS SUMITOMO SEIKA CHEMICALS (JP) 2012-11-21 EP disclosed
EP-2204388-A1 PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS Sumitomo Seika Chemicals CO. LTD. (JP) 2010-07-07 EP disclosed