SCHEMBL346677

SCHEMBL346677

CCC(CCO)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30684 0.85
SCHEMBL212936 0.84
SCHEMBL8804248 0.82 SMN1; SMN2 (0.38)
SCHEMBL1657440 0.81
SCHEMBL50947 0.80 LMNA (0.40)
SCHEMBL31368881 0.80
SCHEMBL20889082 0.80
SCHEMBL997152 0.80
SCHEMBL325666 0.80 TSHR (0.36)
SCHEMBL1715205 0.79 THRB (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220243150-A1 Cleaning Composition For Semiconductor Substrates VERSUM MATERIALS US, LLC (US) 2022-08-04 US claimed
EP-3986997-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATES Versum Materials US, LLC (US) 2022-04-27 EP claimed
WO-2020257103-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATES VERSUM MATERIALS US, LLC (US) 2020-12-24 WO claimed
US-7704602-B2 Iodine/iodide-containing hot melt coatable adhesive, methods and uses therefor 3M INNOVATIVE PROPERTIES COMPANY (US) 2010-04-27 US claimed
JP-8176053-A None JP disclosed
US-20260079400-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-19 US disclosed
US-12545790-B2 Antifoggant composition and anti-fog article having antifogging film formed from said composition NOF CORPORATION (JP) 2026-02-10 US disclosed
EP-4675351-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-01-07 EP disclosed
US-20250370337-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-04 US disclosed
EP-3909782-B1 IMAGE FORMING DEVICE AND IMAGE FORMING METHOD RICOH CO LTD (JP) 2025-07-02 EP disclosed
US-20250123566-A1 ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-04-17 US disclosed
US-20240126168-A1 ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-04-18 US disclosed
WO-1994021612-A1 CARBOSTYRIL DERIVATIVES AS MATRIX METALLOPROTEINASES INHIBITORS OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1994-09-29 WO disclosed
EP-0567271-A2 Steroid derivatives for the treatment of prostatic hypertrophy, their preparation and uses SANKYO COMPANY LIMITED (JP) 1993-10-27 EP disclosed
EP-0275899-A2 Process for preparing particles having monodisperse particle size Nippon Paint Co., Ltd. (JP) 1988-07-27 EP disclosed
US-4532239-A N-phenoxypropanol-N'-pyridazinyl ethylendiamines as β-receptor blockers CASSELLA AKTIENGESELLSCHAFT (DE) 1985-07-30 US disclosed
EP-0054946-B1 BASIC SUBSTITUTED PYRIDAZINES, THEIR PREPARATION AND THEIR USE CASSELLA Aktiengesellschaft (DE) 1984-08-15 EP disclosed
EP-0054946-A1 Basic substituted pyridazines, their preparation and their use CASSELLA Aktiengesellschaft (DE) 1982-06-30 EP disclosed
US-4216314-A CARDIOSELECTIVE B-ADRENOLYTIC AGENTS, ANTIARRHYTHMIC AGENTS AND HYPOTENSIVE AGENTS CASSELLA FARBWERKE MAINKUR AKTIENGESELLSCHAFT (DE) 1980-08-05 US disclosed
US-3985758-A 1,4-Dihydropyridine derivatives YAMANOUCHI PHARMACEUTICAL CO., LTD. (JA) 1976-10-12 US disclosed