Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NISCH | Q9Y2I1 | 3/20 | 0.36 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.31 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.31 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL346854 | 1.00 | NISCH (0.36) | NISCHADRA2AADRA2BADRA2C | |
| Hydrochloric Acid SCHEMBL957781 | 0.98 | NISCH (0.35) | NISCHADRA2AADRA2BADRA2C | |
| Hydrochloric Acid SCHEMBL34133 | 0.98 | NISCH (0.35) | NISCHADRA2AADRA2BADRA2C | |
| SCHEMBL13295932 | 0.94 | NISCH (0.33) | NISCH | |
| Hydrochloric Acid SCHEMBL8386496 | 0.94 | NISCH (0.33) | NISCHADRA2A | |
| SCHEMBL7758130 | 0.80 | NISCH (0.39) | NISCHADRA2AADRA2BADRA2C | |
| SCHEMBL12820853 | 0.74 | NISCH (0.38) | NISCHADRA2AADRA2BADRA2C | |
| Carbromal SCHEMBL5013433 | 0.74 | NR3C1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL3882896 | 0.66 | ADRA2A (0.33) | NISCHADRA2A | |
| Hydrochloric Acid SCHEMBL305948 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3569634-B1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | XEROX CORP (US) | 2023-04-19 | — | — | EP | claimed |
| EP-2634198-B1 | Copolymers containing phosphorylcholine groups and methods of preparing and using the same | SUNTECH CO LTD (KR) | 2014-09-17 | — | — | EP | claimed |
| EP-0767212-B1 | PROCESS FOR PRODUCING AN AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER AND AQUEOUS SOLUTION OF PHOSPHORYLCHOLINE GROUP BEARING POLYMER | NOF CORP (JP) | 2001-07-18 | — | — | EP | claimed |
| WO-2025070165-A1 | PHOTOCURABLE COMPOSITION | サンスター技研株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-20250043103-A1 | RESIN PARTICLE COMPOSITION, TEST KIT, AND MANUFACTURING METHOD OF RESIN PARTICLE COMPOSITION | SAIDEN CHEMICAL INDUSTRY CO., LTD. (JP) | 2025-02-06 | — | — | US | disclosed |
| EP-4501971-A1 | RESIN PARTICLE COMPOSITION, TEST KIT, AND MANUFACTURING METHOD OF RESIN PARTICLE COMPOSITION | Saiden Chemical Industry Co., Ltd. (JP) | 2025-02-05 | — | — | EP | disclosed |
| EP-3722362-B1 | AQUEOUS RESIN DISPERSION, METHOD FOR PRODUCING AQUEOUS RESIN DISPERSION, AQUEOUS COATING MATERIAL, AND ADHESIVE | MITSUBISHI CHEM CORP (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-11787976-B2 | Method of producing anisotropic conductive film and anisotropic conductive film | DEXERIALS CORPORATION (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11784154-B2 | Anisotropic conductive film and method of producing the same | DEXERIALS CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20230312970-A1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| EP-3816246-B1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATINGS CO LTD (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-5061761-A | POLYVINYL ESTER MACROMONOMER AND ITS USES | KURARAY CO., LTD. (JP) | 1991-10-29 | — | — | US | disclosed |
| US-5041352-A | Dispersion stability, ink receptivity | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-20 | — | — | US | disclosed |
| EP-0416591-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0410324-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD (JP) | 1991-01-30 | — | — | EP | disclosed |
| US-4977055-A | RESIN DISPESEDIN NONAQUEOUS SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 1990-12-11 | — | — | US | disclosed |
| EP-0398373-A1 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-11-22 | — | — | EP | disclosed |
| US-4968576-A | POSITIVE CHARGING ABILITY, IMPROVED FLOWABILITY | NIPPON PAINT CO., LTD. (JP) | 1990-11-06 | — | — | US | disclosed |
| EP-0389928-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-03 | — | — | EP | disclosed |
| EP-0324529-A2 | Resinous microparticles useful in powdery toner for electrophotography | Nippon Paint Co., Ltd. (JP) | 1989-07-19 | — | — | EP | disclosed |