Known targets — ChEMBL curated mechanism
ABL1ACEACHEACVR1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALKAVPR1AAVPR2BCHEBCRCA2CACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCASRCCR5CDK4CDK6CFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNA3CHRNA7CHRNB1CHRNB4CHRNDCHRNECHRNGCOXFA4COXFA4L2CRBNCSF1RCUL4ACYP19A1DDB1DPP4DRD1DRD2DRD3DRD4EDNRAEGFREML4ERBB2ERBB4ESR1ESR2FGFR1FGFR3FLT1FLT3FLT4GAAGABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGHSRGLAGNRHRGPD2GRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BGSTP1HCN4HCRTR1HCRTR2HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HRH2HRH3HSD11B1HSP90AA1HSP90AB1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IMPDH1IMPDH2ITGA2BITGB3ITKJAK1JAK2KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNJ2KCNJ3KCNJ5KCNK3KCNK9KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITKLKB1LCKMMAOAMAOBMAPK14METMMP1MMP13MMP7MMP8MT-ND1MT-ND2MT-ND3MT-ND4MT-ND4LMT-ND5MT-ND6NDUFA1NDUFA10NDUFA11NDUFA12NDUFA13NDUFA2NDUFA3NDUFA5NDUFA6NDUFA7NDUFA8NDUFA9NDUFAB1NDUFAF1NDUFAF2NDUFAF3NDUFAF4NDUFB1NDUFB10NDUFB11NDUFB2NDUFB3NDUFB4NDUFB5NDUFB6NDUFB7NDUFB8NDUFB9NDUFC1NDUFC2NDUFS1NDUFS2NDUFS3NDUFS4NDUFS5NDUFS6NDUFS7NDUFS8NDUFV1NDUFV2NDUFV3NR3C1NS5ANTRK1NTRK2NTRK3ODC1OPRD1OPRK1OPRM1P2RY12PAHPARP1PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDE5APDE7APDE7BPDE8APDE8BPDGFRAPDGFRBPIK3CAPIK3CDPNPPOLA1POLA2POLD1POLD2POLD3POLD4POLEPOLE2POLE3PPARGPRIM1PRIM2PRKCAPRKCBPRKCDPRKCEPRKCGPRKCHPRKCIPRKCQPRKCZPRKD1PRKD3PTGS1PTGS2RBX1RENRETROCK1ROCK2RPE65RRM1RRM2RRM2BS1PR1S1PR2S1PR3S1PR4S1PR5SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC18A2SLC6A1SLC6A2SLC6A3SLC6A4SLC9A3SRCTACR1TOP1TOP2ATOP2BTTRTYMPdacAdacBdacCembAfolAftsIgyrAgyrBmrcAmrcBmrdAparCparEpolrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2766372 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL6569922 | 1.00 | — | — | |
| SCHEMBL2348327 | 0.98 | — | — | |
| Hydrochloric Acid SCHEMBL9436965 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL8680082 | 0.83 | — | — | |
| SCHEMBL9325256 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL1713811 | 0.76 | — | — | |
| SCHEMBL20406323 | 0.70 | — | — | |
| SCHEMBL3678510 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL8386496 | 0.69 | NISCH (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 531 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3569634-B1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | XEROX CORP (US) | 2023-04-19 | — | — | EP | claimed |
| US-10703859-B2 | Compositions comprising unsaturated crystalline polyester for 3D printing | XEROX CORPORATION (US) | 2020-07-07 | — | — | US | claimed |
| US-10655025-B2 | Curable unsaturated crystalline polyester powder and methods of making the same | XEROX CORPORATION (US) | 2020-05-19 | — | — | US | claimed |
| US-20190352521-A1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | Genesee Valley Innovations, LLC | 2019-11-21 | — | — | US | claimed |
| US-20190352455-A1 | COMPOSITIONS COMPRISING UNSATURATED CRYSTALLINE POLYESTER FOR 3D PRINTING | Genesee Valley Innovations, LLC | 2019-11-21 | — | — | US | claimed |
| EP-3569633-A1 | COMPOSITIONS COMPRISING UNSATURATED CRYSTALLINE POLYESTER FOR 3D PRINTING | Xerox Corporation (US) | 2019-11-20 | — | — | EP | claimed |
| EP-3569634-A1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | Xerox Corporation (US) | 2019-11-20 | — | — | EP | claimed |
| US-20070298336-A1 | Carrier coating | XEROX CORPORATION (US) | 2007-12-27 | — | — | US | claimed |
| US-6204324-B1 | AN ETHYLENICALLY UNSATURATED POLYMERIZABLE MONOMER HAVING THE PHOSPHORYLCHOLINE GROUP IS POLYMERIZED IN THE PRESENCE OF A NON-METAL POLYMERIZATION INITIATOR SOLUTION CONTAINING PEROXY OR AZO COMPOUNDS | NOF CORPORATION (JP) | 2001-03-20 | — | — | US | claimed |
| US-6391994-B1 | — | — | None | — | — | US | disclosed |
| US-12577432-B2 | Organosilicon compound, production method therefor, and curable composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-17 | — | — | US | disclosed |
| EP-4282653-B1 | ORGANOSILICON COMPOUND, PRODUCTION METHOD THEREFOR, AND CURABLE COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260021471-A1 | WATER-ABSORBING RESIN PARTICLES AND ABSORBENT ARTICLE | SUMITOMO SEIKA CHEMICALS (JP) | 2026-01-22 | — | — | US | disclosed |
| US-12522684-B2 | Active-energy-ray-curable resin composition and cured product thereof | NIPPON SHOKUBAI CO., LTD. (JP) | 2026-01-13 | — | — | US | disclosed |
| EP-0736060-B1 | CROSS-LINKED POLYMERS WITH A POROUS STRUCTURE | STOCKHAUSEN CHEM FAB GMBH (DE) | 1997-07-30 | — | — | EP | disclosed |
| EP-0744435-A1 | WATER-ABSORBENT RESIN, PROCESS FOR PRODUCTION THEREOF, AND WATER-ABSORBENT RESIN COMPOSITION | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-11-27 | — | — | EP | disclosed |
| EP-0736060-A1 | CROSS-LINKED POLYMERS WITH A POROUS STRUCTURE | STOCKHAUSEN CHEM FAB GMBH (DE) | 1996-10-09 | — | — | EP | disclosed |
| EP-0661302-A1 | Process for producing aqueous Dispersion-Type Acrylic Polymer, the acrylic polymer obtained thereby, and pressure-sensitive adhesive comprising the acrylic polymer | NITTO DENKO CORPORATION (JP) | 1995-07-05 | — | — | EP | disclosed |
| WO-1995017455-A1 | CROSS-LINKED POLYMERS WITH A POROUS STRUCTURE, HIGH ABSORBENCY RATE FOR WATER, AQUEOUS SOLUTIONS AND BODILY FLUIDS, PROCESS FOR PRODUCING THEM AND THEIR USE FOR ABSORBING AND/OR RETAINING WATER AND/OR AQUEOUS LIQUIDS | STOCKHAUSEN GMBH & CO. KG (DE) | 1995-06-29 | — | — | WO | disclosed |
| US-5260354-A | Additives for electrodepositable coating compositions | PPG INDUSTRIES, INC. (US) | 1993-11-09 | — | — | US | disclosed |